The development of etch-back processes for industrial silicon solar cells

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RAABE, Bernd, Felix BOOK, Amir DASTGHEIB-SHIRAZI, Giso HAHN, 2010. The development of etch-back processes for industrial silicon solar cells. In: EU PVSEC proceedings : 25th European Photovoltaic Solar Energy Conference and Exhibition / 5th World Conference on Photovoltaic Energy Conversion, 6-10 September 2010, Valencia, Spain. Munich:WIP-Renewable Energies, pp. 1174-1178. ISBN 3-936338-26-4

@inproceedings{Raabe2010devel-16005, title={The development of etch-back processes for industrial silicon solar cells}, year={2010}, doi={10.4229/25thEUPVSEC2010-2AO.3.5}, isbn={3-936338-26-4}, address={Munich}, publisher={WIP-Renewable Energies}, booktitle={EU PVSEC proceedings : 25th European Photovoltaic Solar Energy Conference and Exhibition / 5th World Conference on Photovoltaic Energy Conversion, 6-10 September 2010, Valencia, Spain}, pages={1174--1178}, author={Raabe, Bernd and Book, Felix and Dastgheib-Shirazi, Amir and Hahn, Giso} }

<rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcterms="http://purl.org/dc/terms/" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/rdf/resource/123456789/16005"> <dc:contributor>Hahn, Giso</dc:contributor> <dc:creator>Raabe, Bernd</dc:creator> <dc:contributor>Raabe, Bernd</dc:contributor> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-10-04T10:58:08Z</dcterms:available> <dc:creator>Hahn, Giso</dc:creator> <dcterms:rights rdf:resource="http://nbn-resolving.org/urn:nbn:de:bsz:352-20140905103605204-4002607-1"/> <dc:creator>Book, Felix</dc:creator> <dcterms:bibliographicCitation>Publ. in: 25th European Photovoltaic Solar Energy Conference and Exhibition. 5th World Conference on photovoltaic Energy Conversion : proceedings of the international conference held 6-10 September 2010, in Valencia, Spain / G.F. de Santi, H. Ossenbrink and P. Helm (eds.). Munich, Germany : WIP-Renewable Energies, 2010. pp. 1174-1178</dcterms:bibliographicCitation> <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/16005"/> <dc:contributor>Dastgheib-Shirazi, Amir</dc:contributor> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-10-04T10:58:08Z</dc:date> <dcterms:abstract xml:lang="eng">The exactly controlled wet-chemical etch-back of diffusion profiles can shift the efficiency limit of the widely used screen printing process to higher values. In conjunction with an inkjet or screen printing masking step, the cost effective production of selective emitter solar cells is possible. We present the development of our etch-back process using Cz-Si and mc-Si wafers. Emitter saturation current densities of etch-back emitters are lower compared to directly POCl3-diffused samples with the same sheet resistance. Negative effects of the etch-back process on reflection properties are negligible if less than 90 nm are removed from the surface. Grain boundaries of mc-Si wafers may be etched faster than the rest of the wafer. A screen printed 5 inch Cz-Si selective emitter solar cell with full area Al BSF reached an efficiency of 19.0%. The same process was applied to n-type Cz-Si wafers with a selective front surface field (FSF) and a full area screen printed Al emitter. An efficiency of 18.5% on 6 inch n-type Cz solar cells could be reached in a first test. This emphasizes the highly effective FSF and makes the process attractive for possible industrial production, since no boron-oxygen degradation occurs in n-type silicon.</dcterms:abstract> <dc:contributor>Book, Felix</dc:contributor> <dcterms:title>The development of etch-back processes for industrial silicon solar cells</dcterms:title> <dc:creator>Dastgheib-Shirazi, Amir</dc:creator> <dc:language>eng</dc:language> <dc:rights>deposit-license</dc:rights> <dcterms:issued>2010</dcterms:issued> </rdf:Description> </rdf:RDF>

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