Nanostructuring of thin films by ns pulsed laser interference


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RIEDEL, Stephen, Markus SCHMOTZ, Paul LEIDERER, Johannes BONEBERG, 2010. Nanostructuring of thin films by ns pulsed laser interference. In: Applied Physics A. 101(2), pp. 309-312. ISSN 0947-8396. Available under: doi: 10.1007/s00339-010-5822-x

@article{Riedel2010Nanos-14522, title={Nanostructuring of thin films by ns pulsed laser interference}, year={2010}, doi={10.1007/s00339-010-5822-x}, number={2}, volume={101}, issn={0947-8396}, journal={Applied Physics A}, pages={309--312}, author={Riedel, Stephen and Schmotz, Markus and Leiderer, Paul and Boneberg, Johannes} }

<rdf:RDF xmlns:dcterms="" xmlns:dc="" xmlns:rdf="" xmlns:bibo="" xmlns:dspace="" xmlns:foaf="" xmlns:void="" xmlns:xsd="" > <rdf:Description rdf:about=""> <dc:contributor>Riedel, Stephen</dc:contributor> <dcterms:title>Nanostructuring of thin films by ns pulsed laser interference</dcterms:title> <dc:creator>Boneberg, Johannes</dc:creator> <bibo:uri rdf:resource=""/> <dc:contributor>Boneberg, Johannes</dc:contributor> <dcterms:bibliographicCitation>First publ. in: Applied Physics A ; 101 (2010), 2. - S. 309-312</dcterms:bibliographicCitation> <dc:creator>Schmotz, Markus</dc:creator> <dcterms:hasPart rdf:resource=""/> <dc:contributor>Schmotz, Markus</dc:contributor> <dc:contributor>Leiderer, Paul</dc:contributor> <dcterms:isPartOf rdf:resource=""/> <dcterms:rights rdf:resource=""/> <dcterms:issued>2010</dcterms:issued> <dc:creator>Riedel, Stephen</dc:creator> <dcterms:available rdf:datatype="">2011-11-09T08:41:10Z</dcterms:available> <dspace:isPartOfCollection rdf:resource=""/> <dc:creator>Leiderer, Paul</dc:creator> <dspace:hasBitstream rdf:resource=""/> <foaf:homepage rdf:resource="http://localhost:8080/jspui"/> <dc:date rdf:datatype="">2011-11-09T08:41:10Z</dc:date> <dc:rights>terms-of-use</dc:rights> <dc:language>eng</dc:language> <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/> <dcterms:abstract xml:lang="eng">We show that nanosecond pulsed laser interference can be used to structure surfaces on a nanoscale. With this method, we are able to create hollow structures on various thin films like Ta, Ni, Au, Cu, Co, and NiTi. We find that the structuring mechanism is related to the mechanical effect of thermal expansion upon melting. To corroborate this model, we study materials with an abnormal behavior at the melting point like Si, Ge, or Bi, as they contract upon melting.</dcterms:abstract> </rdf:Description> </rdf:RDF>

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