Publikation: The formation of nano-dot and nano-ring structures in colloidal monolayer lithography
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Monolayers of colloidal particles formed in a self-organizingpmcess upon dryingof a colloidal suspension arc used as lithographic masks. After deposition of a thin metal layer, the mask is detached from the surface. The resulting surface is examined with optical, scanning electron, and atomic force microscopes. In addition to the well-known triangular structures, which reflect the gaps in the hexagonal arrangement of the particles, we observed the following additional features: hillocks (nano-dots) found just below and nano-rings found around the original location of the particles. These features may develop during detachment (hillocks) and formation (rings) of the mask, respectively. Hillocks develop as a consequence of the adhesion of the particles on the surface, whereas rings are formed h m organic residuals in the suspension. We show that these features can be used to fabricate fluorescent dye rings of submicron size.
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BONEBERG, Johannes, Frank BURMEISTER, Claudia SCHÄFLE, Paul LEIDERER, D. REIM, Andreas FERY, Stephan HERMINGHAUS, 1997. The formation of nano-dot and nano-ring structures in colloidal monolayer lithography. In: Langmuir : the ACS journal of surfaces and colloids. 1997, 13(26), pp. 7080-7084. ISSN 0743-7463. eISSN 1520-5827. Available under: doi: 10.1021/la9704922BibTex
@article{Boneberg1997forma-5171, year={1997}, doi={10.1021/la9704922}, title={The formation of nano-dot and nano-ring structures in colloidal monolayer lithography}, number={26}, volume={13}, issn={0743-7463}, journal={Langmuir : the ACS journal of surfaces and colloids}, pages={7080--7084}, author={Boneberg, Johannes and Burmeister, Frank and Schäfle, Claudia and Leiderer, Paul and Reim, D. and Fery, Andreas and Herminghaus, Stephan} }
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