Acoustic laser cleaning of silicon surfaces

We investigate the detachment of small particles from silicon surfaces by means of acoustic waves generated by laser-induced plasma formation at the back side of the sample. It is demonstrated that sufﬁciently high acoustic intensities can be reached to detach particles in the submicron regime. In order to study this acoustic laser cleaning in more detail, we have developed an interference technique which allows one to determine the elongation and acceleration of the surface with high temporal resolution, the basis for an analysis of the nanomechanical detachment process, which takes place on a temporal scale of nanoseconds. We ﬁnd that the velocity of the detaching particles is signiﬁcantly higher than the maximum velocity of the substrate surface. This indicates that not only inertial forces, but also elastic deformations of the particles, resulting from the acoustic pulse, play an important role for the cleaning process.

Subject (DDC)

530 Physics

Keywords

Laser Cleaning,Acoustics,Silicon

Cite This

ISO 690

GELDHAUSER, Tobias, Florian ZIESE, Florian MERKT, Artur ERBE, Johannes BONEBERG, Paul LEIDERER, 2007. Acoustic laser cleaning of silicon surfaces. In: Applied Physics / A, Materials Science and Processing. 89, pp. 109-113. Available under: doi: 10.1007/s00339-007-4190-7

BibTex

@article{Geldhauser2007Acous-4959,
  year={2007},
  doi={10.1007/s00339-007-4190-7},
  title={Acoustic laser cleaning of silicon surfaces},
  volume={89},
  journal={Applied Physics / A, Materials Science and Processing},
  pages={109--113},
  author={Geldhauser, Tobias and Ziese, Florian and Merkt, Florian and Erbe, Artur and Boneberg, Johannes and Leiderer, Paul}
}

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