Ultrafast Yb:YAG thin-disk oscillator with pulse energies exceeding 25 μJ suitable for efficient ablation with negligible heat affects

dc.contributor.authorNeuhaus, Jörg
dc.contributor.authorBauer, Dominik
dc.contributor.authorScharfenberg, Christoph
dc.contributor.authorSutter, Dirk H.
dc.contributor.authorKleinbauer, Jochen
dc.contributor.authorWeiler, Sascha
dc.contributor.authorKilli, Alexander
dc.contributor.authorDekorsy, Thomas
dc.date.accessioned2022-07-29T07:31:03Z
dc.date.available2022-07-29T07:31:03Z
dc.date.issued2009eng
dc.description.abstractWe have studied experimentally and numerically the pulse shaping dynamics of a diode-pumped thin-disk laser oscillator with active multipass cell and large output coupling rates. We demonstrate the generation of high energy subpicosecond pulses with energies of up to 25.9 μJ and durations of 928 fs directly from a thin-disk laser oscillator without further amplification. We have achieved these results by employing a selfimaging active multipass geometry in order to increase the output coupling rate for a suppression of nonlinear optical effects. With this system we have obtained stable single pulse operation in ambient atmosphere with average output powers above 76W at a repetition rate of 2.93 MHz. A semiconductor saturable absorber mirror was used to start and stabilize passive soliton mode locking. The experimentally studied laser pulses show good agreement with numerical simulations including the appearance of Kelly sidebands. We also present a modification to the soliton area theorem that is applicable for such a laser oscillator with active multiple pass cell and large output coupling rate. Furthermore, we demonstrate the laser's potential for micro machining applications by showing first examples of material processing, such as the determination of ablation thresholds and ablation rates for various materials.eng
dc.description.versionpublishedde
dc.identifier.doi10.1117/12.807538eng
dc.identifier.urihttps://kops.uni-konstanz.de/handle/123456789/58209
dc.language.isoengeng
dc.subject.ddc530eng
dc.titleUltrafast Yb:YAG thin-disk oscillator with pulse energies exceeding 25 μJ suitable for efficient ablation with negligible heat affectseng
dc.typeINPROCEEDINGSde
dspace.entity.typePublication
kops.citation.bibtex
@inproceedings{Neuhaus2009Ultra-58209,
  year={2009},
  doi={10.1117/12.807538},
  title={Ultrafast Yb:YAG thin-disk oscillator with pulse energies exceeding 25 μJ suitable for efficient ablation with negligible heat affects},
  number={7203},
  isbn={978-0-8194-7449-0},
  issn={0277-786X},
  publisher={SPIE},
  address={Bellingham, Washington},
  series={Proceedings of SPIE},
  booktitle={Commercial and biomedical applications of ultrafast lasers IX : 25 - 28 January 2009, San Jose, California, United States},
  editor={Neev, Joseph},
  author={Neuhaus, Jörg and Bauer, Dominik and Scharfenberg, Christoph and Sutter, Dirk H. and Kleinbauer, Jochen and Weiler, Sascha and Killi, Alexander and Dekorsy, Thomas},
  note={Article Number: 72030T}
}
kops.citation.iso690NEUHAUS, Jörg, Dominik BAUER, Christoph SCHARFENBERG, Dirk H. SUTTER, Jochen KLEINBAUER, Sascha WEILER, Alexander KILLI, Thomas DEKORSY, 2009. Ultrafast Yb:YAG thin-disk oscillator with pulse energies exceeding 25 μJ suitable for efficient ablation with negligible heat affects. Commercial and Biomedical Applications of Ultrafast Lasers IX. San Jose, California, 25. Jan. 2009 - 28. Jan. 2009. In: NEEV, Joseph, ed. and others. Commercial and biomedical applications of ultrafast lasers IX : 25 - 28 January 2009, San Jose, California, United States. Bellingham, Washington: SPIE, 2009, 72030T. Proceedings of SPIE. 7203. ISSN 0277-786X. ISBN 978-0-8194-7449-0. Available under: doi: 10.1117/12.807538deu
kops.citation.iso690NEUHAUS, Jörg, Dominik BAUER, Christoph SCHARFENBERG, Dirk H. SUTTER, Jochen KLEINBAUER, Sascha WEILER, Alexander KILLI, Thomas DEKORSY, 2009. Ultrafast Yb:YAG thin-disk oscillator with pulse energies exceeding 25 μJ suitable for efficient ablation with negligible heat affects. Commercial and Biomedical Applications of Ultrafast Lasers IX. San Jose, California, Jan 25, 2009 - Jan 28, 2009. In: NEEV, Joseph, ed. and others. Commercial and biomedical applications of ultrafast lasers IX : 25 - 28 January 2009, San Jose, California, United States. Bellingham, Washington: SPIE, 2009, 72030T. Proceedings of SPIE. 7203. ISSN 0277-786X. ISBN 978-0-8194-7449-0. Available under: doi: 10.1117/12.807538eng
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kops.conferencefieldCommercial and Biomedical Applications of Ultrafast Lasers IX, 25. Jan. 2009 - 28. Jan. 2009, San Jose, Californiadeu
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kops.sourcefieldNEEV, Joseph, ed. and others. <i>Commercial and biomedical applications of ultrafast lasers IX : 25 - 28 January 2009, San Jose, California, United States</i>. Bellingham, Washington: SPIE, 2009, 72030T. Proceedings of SPIE. 7203. ISSN 0277-786X. ISBN 978-0-8194-7449-0. Available under: doi: 10.1117/12.807538deu
kops.sourcefield.plainNEEV, Joseph, ed. and others. Commercial and biomedical applications of ultrafast lasers IX : 25 - 28 January 2009, San Jose, California, United States. Bellingham, Washington: SPIE, 2009, 72030T. Proceedings of SPIE. 7203. ISSN 0277-786X. ISBN 978-0-8194-7449-0. Available under: doi: 10.1117/12.807538deu
kops.sourcefield.plainNEEV, Joseph, ed. and others. Commercial and biomedical applications of ultrafast lasers IX : 25 - 28 January 2009, San Jose, California, United States. Bellingham, Washington: SPIE, 2009, 72030T. Proceedings of SPIE. 7203. ISSN 0277-786X. ISBN 978-0-8194-7449-0. Available under: doi: 10.1117/12.807538eng
kops.title.conferenceCommercial and Biomedical Applications of Ultrafast Lasers IXeng
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source.titleCommercial and biomedical applications of ultrafast lasers IX : 25 - 28 January 2009, San Jose, California, United Stateseng

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