Publikation: Thin film and surface preparation chamber for the low energy muons spectrometer
Lade...
Dateien
Datum
2023
Autor:innen
Teuschl, Hanna
Lourenço, Leandro M. O.
Prokscha, Thomas
Vieira, Ricardo B. L.
Salman, Zaher
Herausgeber:innen
ISSN der Zeitschrift
Electronic ISSN
ISBN
Bibliografische Daten
Verlag
Schriftenreihe
Auflagebezeichnung
URI (zitierfähiger Link)
DOI (zitierfähiger Link)
Internationale Patentnummer
Link zur Lizenz
Angaben zur Forschungsförderung
Projekt
Open Access-Veröffentlichung
Open Access Hybrid
Sammlungen
Core Facility der Universität Konstanz
Titel in einer weiteren Sprache
Publikationstyp
Zeitschriftenartikel
Publikationsstatus
Published
Erschienen in
Journal of Physics: Conference Series. IOP Publishing. 2023, 2462(1), 012050. ISSN 1742-6588. eISSN 1742-6596. Available under: doi: 10.1088/1742-6596/2462/1/012050
Zusammenfassung
We have designed and constructed a thin film preparation chamber with base pressure of <2×10−9 mbar. Currently, the chamber is equipped with two large area evaporators (a molecular evaporator and an electron-beam evaporator), an ion sputtering gun, a thickness monitor and a substrate heater. It is designed such that it can handle large area thin film samples with a future possibility to transfer them in vacuum directly to the low energy muons (LEM) spectrometer or to other advanced characterization facilities in the Quantum Matter and Materials Center (QMMC) which will be constructed in 2024. Initial commissioning of the chamber resulted in high quality, large area and uniform molecular films of CuPc and TbPcsub>2 on various substrate materials. We present first results from low energy µSR (LE-µSR) measurements on these films.
Zusammenfassung in einer weiteren Sprache
Fachgebiet (DDC)
530 Physik
Schlagwörter
Konferenz
Rezension
undefined / . - undefined, undefined
Zitieren
ISO 690
TEUSCHL, Hanna, Angelo DI BERNARDO, Leandro M. O. LOURENÇO, Thomas PROKSCHA, Ricardo B. L. VIEIRA, Zaher SALMAN, 2023. Thin film and surface preparation chamber for the low energy muons spectrometer. In: Journal of Physics: Conference Series. IOP Publishing. 2023, 2462(1), 012050. ISSN 1742-6588. eISSN 1742-6596. Available under: doi: 10.1088/1742-6596/2462/1/012050BibTex
@article{Teuschl2023surfa-67210,
year={2023},
doi={10.1088/1742-6596/2462/1/012050},
title={Thin film and surface preparation chamber for the low energy muons spectrometer},
number={1},
volume={2462},
issn={1742-6588},
journal={Journal of Physics: Conference Series},
author={Teuschl, Hanna and Di Bernardo, Angelo and Lourenço, Leandro M. O. and Prokscha, Thomas and Vieira, Ricardo B. L. and Salman, Zaher},
note={Article Number: 012050}
}RDF
<rdf:RDF
xmlns:dcterms="http://purl.org/dc/terms/"
xmlns:dc="http://purl.org/dc/elements/1.1/"
xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
xmlns:bibo="http://purl.org/ontology/bibo/"
xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
xmlns:foaf="http://xmlns.com/foaf/0.1/"
xmlns:void="http://rdfs.org/ns/void#"
xmlns:xsd="http://www.w3.org/2001/XMLSchema#" >
<rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/67210">
<void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
<dc:rights>Attribution 3.0 Unported</dc:rights>
<dc:creator>Prokscha, Thomas</dc:creator>
<dc:contributor>Lourenço, Leandro M. O.</dc:contributor>
<dc:creator>Teuschl, Hanna</dc:creator>
<dc:contributor>Teuschl, Hanna</dc:contributor>
<dc:contributor>Di Bernardo, Angelo</dc:contributor>
<dc:contributor>Salman, Zaher</dc:contributor>
<bibo:uri rdf:resource="https://kops.uni-konstanz.de/handle/123456789/67210"/>
<dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
<dc:creator>Lourenço, Leandro M. O.</dc:creator>
<dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/67210/1/Teuschl_2-qjst5kqs6y8z1.pdf"/>
<foaf:homepage rdf:resource="http://localhost:8080/"/>
<dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/67210/1/Teuschl_2-qjst5kqs6y8z1.pdf"/>
<dc:creator>Vieira, Ricardo B. L.</dc:creator>
<dcterms:rights rdf:resource="http://creativecommons.org/licenses/by/3.0/"/>
<dc:contributor>Vieira, Ricardo B. L.</dc:contributor>
<dcterms:issued>2023</dcterms:issued>
<dcterms:title>Thin film and surface preparation chamber for the low energy muons spectrometer</dcterms:title>
<dc:creator>Salman, Zaher</dc:creator>
<dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
<dcterms:abstract>We have designed and constructed a thin film preparation chamber with base pressure of <2×10<sup>−9</sup> mbar. Currently, the chamber is equipped with two large area evaporators (a molecular evaporator and an electron-beam evaporator), an ion sputtering gun, a thickness monitor and a substrate heater. It is designed such that it can handle large area thin film samples with a future possibility to transfer them in vacuum directly to the low energy muons (LEM) spectrometer or to other advanced characterization facilities in the Quantum Matter and Materials Center (QMMC) which will be constructed in 2024. Initial commissioning of the chamber resulted in high quality, large area and uniform molecular films of CuPc and TbPcsub>2</sub> on various substrate materials. We present first results from low energy µSR (LE-µSR) measurements on these films.</dcterms:abstract>
<dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2023-06-23T09:25:07Z</dc:date>
<dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2023-06-23T09:25:07Z</dcterms:available>
<dc:language>eng</dc:language>
<dc:creator>Di Bernardo, Angelo</dc:creator>
<dc:contributor>Prokscha, Thomas</dc:contributor>
</rdf:Description>
</rdf:RDF>Interner Vermerk
xmlui.Submission.submit.DescribeStep.inputForms.label.kops_note_fromSubmitter
Prüfungsdatum der Dissertation
Finanzierungsart
Kommentar zur Publikation
Allianzlizenz
Corresponding Authors der Uni Konstanz vorhanden
Internationale Co-Autor:innen
Universitätsbibliographie
Ja
Begutachtet
Nein
