Universal threshold for the steam laser cleaning of submicron spherical particles from silicon

Mosbacher, Mario; Dobler, Volker; Boneberg, Johannes; Leiderer, Paul

Universal threshold for the steam laser cleaning of submicron spherical particles from silicon

Dateien

266_applph_2000.pdfGröße: 430.63 KBDownloads: 322

Datum

2000

Autor:innen

Mosbacher, Mario

Dobler, Volker

Boneberg, Johannes

Leiderer, Paul

Open Access-Veröffentlichung

Open Access Green

Sammlungen

Physik

Publikationstyp

Zeitschriftenartikel

Publikationsstatus

Published

Erschienen in

Applied Physics / A, Materials Science and Processing. 2000, 70(6), pp. 669-672. Available under: doi: 10.1007/PL00021079

Zusammenfassung

The efficiency of the steam laser cleaning process is examined. For the investigation of the physics of particle removal from the particularly interesting surface of silicon we have deposited well-characterized spherical polymer and silica particles of different diameters ranging from several tens to hundreds of nanometers on commercial wafers. As a result of our systematic study we observe a sharp threshold of the steam cleaning process at 110 mJ/cm2 (h=532 nm, FWHMD=7 ns) which is independent of the size (for particles with diameters as small as 60 nm) and material of the particles. An efficiency above 90% after 20 cleaning steps is reached at a laser fluence of 170 mJ/cm2. Experiments with irregularly shaped alumina particles exhibit the same threshold as for spherical particles.

Fachgebiet (DDC)

530 Physik

Zitieren

ISO 690

MOSBACHER, Mario, Volker DOBLER, Johannes BONEBERG, Paul LEIDERER, 2000. Universal threshold for the steam laser cleaning of submicron spherical particles from silicon. In: Applied Physics / A, Materials Science and Processing. 2000, 70(6), pp. 669-672. Available under: doi: 10.1007/PL00021079

BibTex

@article{Mosbacher2000Unive-5196,
  year={2000},
  doi={10.1007/PL00021079},
  title={Universal threshold for the steam laser cleaning of submicron spherical particles from silicon},
  number={6},
  volume={70},
  journal={Applied Physics / A, Materials Science and Processing},
  pages={669--672},
  author={Mosbacher, Mario and Dobler, Volker and Boneberg, Johannes and Leiderer, Paul}
}

RDF

<rdf:RDF
    xmlns:dcterms="http://purl.org/dc/terms/"
    xmlns:dc="http://purl.org/dc/elements/1.1/"
    xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
    xmlns:bibo="http://purl.org/ontology/bibo/"
    xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
    xmlns:foaf="http://xmlns.com/foaf/0.1/"
    xmlns:void="http://rdfs.org/ns/void#"
    xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > 
  <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/5196">
    <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5196/1/266_applph_2000.pdf"/>
    <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/5196"/>
    <foaf:homepage rdf:resource="http://localhost:8080/"/>
    <dcterms:abstract xml:lang="eng">The efficiency of the  steam laser cleaning  process is examined. For the investigation of the physics of particle removal from the particularly interesting surface of silicon we have deposited well-characterized spherical polymer and silica particles of different diameters ranging from several tens to hundreds of nanometers on commercial wafers. As a result of our systematic study we observe a sharp threshold of the steam cleaning process at 110 mJ/cm2 (h=532 nm, FWHMD=7 ns) which is independent of the size (for particles with diameters as small as 60 nm) and material of the particles. An efficiency above 90% after 20 cleaning steps is reached at a laser fluence of 170 mJ/cm2. Experiments with irregularly shaped alumina particles exhibit the same threshold as for spherical particles.</dcterms:abstract>
    <dc:creator>Mosbacher, Mario</dc:creator>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dc:creator>Boneberg, Johannes</dc:creator>
    <dcterms:bibliographicCitation>First publ. in: Applied Physics / A, Materials Science and Processing, 70 (2000), 6, pp. 669-672</dcterms:bibliographicCitation>
    <dc:language>eng</dc:language>
    <dc:creator>Leiderer, Paul</dc:creator>
    <dcterms:issued>2000</dcterms:issued>
    <dc:creator>Dobler, Volker</dc:creator>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:53:56Z</dcterms:available>
    <dc:contributor>Dobler, Volker</dc:contributor>
    <dc:contributor>Boneberg, Johannes</dc:contributor>
    <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5196/1/266_applph_2000.pdf"/>
    <dc:contributor>Leiderer, Paul</dc:contributor>
    <dc:contributor>Mosbacher, Mario</dc:contributor>
    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:53:56Z</dc:date>
    <dcterms:title>Universal threshold for the steam laser cleaning of submicron spherical particles from silicon</dcterms:title>
    <dcterms:rights rdf:resource="http://creativecommons.org/licenses/by-nc-nd/2.0/"/>
    <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
    <dc:format>application/pdf</dc:format>
    <dc:rights>Attribution-NonCommercial-NoDerivs 2.0 Generic</dc:rights>
  </rdf:Description>
</rdf:RDF>

Universitätsbibliographie

Ja