Publikation: Bulk and surface instabilities in boron doped float-zone samples during light induced degradation treatments
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Float-zone silicon is often used as a supposedly stable high lifetime reference material. Here it is shown, however, that boron doped float-zone samples that underwent a fast firing step may suffer from a severe degradation in bulk lifetime during illumination at elevated temperatures. Furthermore, it is observed that silicon nitride related passivation may be affected by a long-term decrease in chemical passivation quality. A time and injection resolved visualization is introduced to quickly distinguish between these degradation features. Both bulk lifetime and chemical passivation quality are shown to recover at the same treatment conditions after longer treatment times.
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SPERBER, David, Alexander GRAF, Adrian HEILEMANN, Axel HERGUTH, Giso HAHN, 2017. Bulk and surface instabilities in boron doped float-zone samples during light induced degradation treatments. 7th International Conference on Silicon Photovoltaics, SiliconPV 2017. Freiburg, 3. Apr. 2017 - 5. Apr. 2017. In: PREU, Ralf, ed.. 7th International Conference on Silicon Photovoltaics, SiliconPV 2017, 3-5 April 2017, Freiburg, Germany. Amsterdam: Elsevier, 2017, pp. 794-798. Energy Procedia. 124. eISSN 1876-6102. Available under: doi: 10.1016/j.egypro.2017.09.349BibTex
@inproceedings{Sperber2017surfa-41740, year={2017}, doi={10.1016/j.egypro.2017.09.349}, title={Bulk and surface instabilities in boron doped float-zone samples during light induced degradation treatments}, number={124}, publisher={Elsevier}, address={Amsterdam}, series={Energy Procedia}, booktitle={7th International Conference on Silicon Photovoltaics, SiliconPV 2017, 3-5 April 2017, Freiburg, Germany}, pages={794--798}, editor={Preu, Ralf}, author={Sperber, David and Graf, Alexander and Heilemann, Adrian and Herguth, Axel and Hahn, Giso} }
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<rdf:RDF xmlns:dcterms="http://purl.org/dc/terms/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#" xmlns:foaf="http://xmlns.com/foaf/0.1/" xmlns:void="http://rdfs.org/ns/void#" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41740"> <bibo:uri rdf:resource="https://kops.uni-konstanz.de/handle/123456789/41740"/> <dc:rights>terms-of-use</dc:rights> <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2018-03-09T12:19:00Z</dc:date> <dcterms:issued>2017</dcterms:issued> <dc:contributor>Hahn, Giso</dc:contributor> <dc:creator>Hahn, Giso</dc:creator> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2018-03-09T12:19:00Z</dcterms:available> <dc:creator>Herguth, Axel</dc:creator> <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/41740/3/Sperber_2-z1m8hyzh0bty6.pdf"/> <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/> <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/> <dc:creator>Sperber, David</dc:creator> <dcterms:abstract xml:lang="eng">Float-zone silicon is often used as a supposedly stable high lifetime reference material. Here it is shown, however, that boron doped float-zone samples that underwent a fast firing step may suffer from a severe degradation in bulk lifetime during illumination at elevated temperatures. Furthermore, it is observed that silicon nitride related passivation may be affected by a long-term decrease in chemical passivation quality. A time and injection resolved visualization is introduced to quickly distinguish between these degradation features. Both bulk lifetime and chemical passivation quality are shown to recover at the same treatment conditions after longer treatment times.</dcterms:abstract> <dc:language>eng</dc:language> <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/41740/3/Sperber_2-z1m8hyzh0bty6.pdf"/> <dc:contributor>Graf, Alexander</dc:contributor> <dc:contributor>Sperber, David</dc:contributor> <dc:creator>Heilemann, Adrian</dc:creator> <dc:creator>Graf, Alexander</dc:creator> <dc:contributor>Heilemann, Adrian</dc:contributor> <dc:contributor>Herguth, Axel</dc:contributor> <foaf:homepage rdf:resource="http://localhost:8080/"/> <dcterms:title>Bulk and surface instabilities in boron doped float-zone samples during light induced degradation treatments</dcterms:title> <dcterms:rights rdf:resource="https://rightsstatements.org/page/InC/1.0/"/> </rdf:Description> </rdf:RDF>