Publikation:

Influence of storage time on laser cleaning of SiO2 on Si

Vorschaubild

Dateien

313_applph_2003.pdf
313_applph_2003.pdfGröße: 584.58 KBDownloads: 391

Datum

2003

Autor:innen

Schrems, Gernot
Delamare, Marie-Pierre
Arnold, Nikita
Bäuerle, Dieter

Herausgeber:innen

Kontakt

ISSN der Zeitschrift

Electronic ISSN

ISBN

Bibliografische Daten

Verlag

Schriftenreihe

Auflagebezeichnung

URI (zitierfähiger Link)
http://nbn-resolving.de/urn:nbn:de:bsz:352-opus-27633
DOI (zitierfähiger Link)
https://doi.org/10.1007/s00339-002-1761-5
ArXiv-ID

Internationale Patentnummer

Link zur Lizenz
Attribution-NonCommercial-NoDerivs 2.0 Generic

Angaben zur Forschungsförderung

Projekt

Open Access-Veröffentlichung
Open Access Green

Sammlungen

Physik: Publikationen
Core Facility der Universität Konstanz

Gesperrt bis

Titel in einer weiteren Sprache

Publikationstyp
Zeitschriftenartikel
Publikationsstatus
Published

Erschienen in

Applied Physics A. 2003, 76(5), pp. 847-849. Available under: doi: 10.1007/s00339-002-1761-5

Zusammenfassung

The influence of the 'storage time' Fs on the threshold fluence Jcl and the efficiency in dry laser cleaning is investigated. Fs denotes the time between the deposition of particles and the cleaning. As a model system we employed silica spheres with diameters of 500 nm and 1500 nm on commercial silicon wafers and single-pulse KrF excimer laser radiation (FFWHM=28 ns). For the 1500-nm silica spheres, Jcl was found to increase from about 65 mJ/cm2 to 125 mJ/cm2 for storage times of 4 h and 362 h, respectively. For 500-nm silica spheres the increase in the threshold fluence was less than 20% for storage times up to 386 h.

Zusammenfassung in einer weiteren Sprache

Fachgebiet (DDC)
530 Physik

Schlagwörter

Konferenz

Rezension
undefined / . - undefined, undefined

Forschungsvorhaben

Organisationseinheiten

Zeitschriftenheft

Zugehörige Datensätze in KOPS

Zitieren

ISO 690SCHREMS, Gernot, Marie-Pierre DELAMARE, Nikita ARNOLD, Paul LEIDERER, Dieter BÄUERLE, 2003. Influence of storage time on laser cleaning of SiO2 on Si. In: Applied Physics A. 2003, 76(5), pp. 847-849. Available under: doi: 10.1007/s00339-002-1761-5
BibTex
@article{Schrems2003Influ-8981,
  year={2003},
  doi={10.1007/s00339-002-1761-5},
  title={Influence of storage time on laser cleaning of SiO2 on Si},
  number={5},
  volume={76},
  journal={Applied Physics A},
  pages={847--849},
  author={Schrems, Gernot and Delamare, Marie-Pierre and Arnold, Nikita and Leiderer, Paul and Bäuerle, Dieter}
}
RDF
<rdf:RDF
    xmlns:dcterms="http://purl.org/dc/terms/"
    xmlns:dc="http://purl.org/dc/elements/1.1/"
    xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
    xmlns:bibo="http://purl.org/ontology/bibo/"
    xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
    xmlns:foaf="http://xmlns.com/foaf/0.1/"
    xmlns:void="http://rdfs.org/ns/void#"
    xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > 
  <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/8981">
    <dcterms:bibliographicCitation>First publ. in: Applied Physics A 76 (2003), 5, pp. 847-849</dcterms:bibliographicCitation>
    <dc:rights>Attribution-NonCommercial-NoDerivs 2.0 Generic</dc:rights>
    <dc:language>eng</dc:language>
    <dc:creator>Bäuerle, Dieter</dc:creator>
    <dc:creator>Leiderer, Paul</dc:creator>
    <dc:format>application/pdf</dc:format>
    <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/8981"/>
    <foaf:homepage rdf:resource="http://localhost:8080/"/>
    <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T17:52:35Z</dcterms:available>
    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T17:52:35Z</dc:date>
    <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/8981/1/313_applph_2003.pdf"/>
    <dcterms:rights rdf:resource="http://creativecommons.org/licenses/by-nc-nd/2.0/"/>
    <dc:creator>Delamare, Marie-Pierre</dc:creator>
    <dc:contributor>Schrems, Gernot</dc:contributor>
    <dcterms:title>Influence of storage time on laser cleaning of SiO2 on Si</dcterms:title>
    <dc:contributor>Arnold, Nikita</dc:contributor>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dc:contributor>Bäuerle, Dieter</dc:contributor>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dc:contributor>Delamare, Marie-Pierre</dc:contributor>
    <dcterms:abstract xml:lang="eng">The influence of the 'storage time' Fs on the threshold fluence Jcl and the efficiency in dry laser cleaning is investigated. Fs denotes the time between the deposition of particles and the cleaning. As a model system we employed silica spheres with diameters of 500 nm and 1500 nm on commercial silicon wafers and single-pulse KrF excimer laser radiation (FFWHM=28 ns). For the 1500-nm silica spheres, Jcl was found to increase from about 65 mJ/cm2 to 125 mJ/cm2 for storage times of 4 h and 362 h, respectively. For 500-nm silica spheres the increase in the threshold fluence was less than 20% for storage times up to 386 h.</dcterms:abstract>
    <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
    <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/8981/1/313_applph_2003.pdf"/>
    <dc:creator>Schrems, Gernot</dc:creator>
    <dc:creator>Arnold, Nikita</dc:creator>
    <dc:contributor>Leiderer, Paul</dc:contributor>
    <dcterms:issued>2003</dcterms:issued>
  </rdf:Description>
</rdf:RDF>

Interner Vermerk

xmlui.Submission.submit.DescribeStep.inputForms.label.kops_note_fromSubmitter

Kontakt
URL der Originalveröffentl.

Prüfdatum der URL

Prüfungsdatum der Dissertation

Finanzierungsart

Kommentar zur Publikation

Allianzlizenz
Corresponding Authors der Uni Konstanz vorhanden
Internationale Co-Autor:innen
Universitätsbibliographie
Ja
Begutachtet
Diese Publikation teilen