Fundamental microscopic studies on the etching behavior of silver pastes on poly-Si/SiOx passivating contacts

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Screen printing of Ag paste is a key process for implementing polycrystalline-silicon/silicon oxide (poly-Si/SiOx) passivating contacts in industrial solar cells. Thereby, the formation of Ag crystallites on the Si surface is crucial for a low-ohmic contact. Recently, it has been observed that Ag crystallites are predominantly formed within the poly-Si layer and stop at the thermal SiOx, thermal interface, causing a cuboidal shape. To avoid a direct contact of the Ag crystallites with the underlying SiOx, thermal/crystalline-Si (c-Si) interface, a multilayer approach with interlayer SiOx, inter between several poly-Si layers is presented. A stack of three 50 nm poly-Si layers achieves highest cell potential. Further, the metallization process parameters are scanned to check when this cuboidal Ag crystallite shape occurs. While different amorphous-silicon (a-Si) deposition techniques show no changes, there are strong indications that the glass frit etching is responsible for a different etching mechanism causing the breakdown of the SiOx stop.

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ISO 690GLATTHAAR, Raphael, Beatriz CELA GREVEN, Tobias OKKER, Frank HUSTER, Giso HAHN, Barbara TERHEIDEN, 2023. Fundamental microscopic studies on the etching behavior of silver pastes on poly-Si/SiOx passivating contacts. In: Solar Energy Materials and Solar Cells. Elsevier. 2023, 261, 112516. ISSN 0927-0248. eISSN 1879-3398. Available under: doi: 10.1016/j.solmat.2023.112516
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@article{Glatthaar2023Funda-67702,
  year={2023},
  doi={10.1016/j.solmat.2023.112516},
  title={Fundamental microscopic studies on the etching behavior of silver pastes on poly-Si/SiO<sub>x</sub> passivating contacts},
  volume={261},
  issn={0927-0248},
  journal={Solar Energy Materials and Solar Cells},
  author={Glatthaar, Raphael and Cela Greven, Beatriz and Okker, Tobias and Huster, Frank and Hahn, Giso and Terheiden, Barbara},
  note={Article Number: 112516}
}
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