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Fundamental microscopic studies on the etching behavior of silver pastes on poly-Si/SiOx passivating contacts

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2023

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Solar Energy Materials and Solar Cells. Elsevier. 2023, 261, 112516. ISSN 0927-0248. eISSN 1879-3398. Verfügbar unter: doi: 10.1016/j.solmat.2023.112516

Zusammenfassung

Screen printing of Ag paste is a key process for implementing polycrystalline-silicon/silicon oxide (poly-Si/SiOx) passivating contacts in industrial solar cells. Thereby, the formation of Ag crystallites on the Si surface is crucial for a low-ohmic contact. Recently, it has been observed that Ag crystallites are predominantly formed within the poly-Si layer and stop at the thermal SiOx, thermal interface, causing a cuboidal shape. To avoid a direct contact of the Ag crystallites with the underlying SiOx, thermal/crystalline-Si (c-Si) interface, a multilayer approach with interlayer SiOx, inter between several poly-Si layers is presented. A stack of three 50 nm poly-Si layers achieves highest cell potential. Further, the metallization process parameters are scanned to check when this cuboidal Ag crystallite shape occurs. While different amorphous-silicon (a-Si) deposition techniques show no changes, there are strong indications that the glass frit etching is responsible for a different etching mechanism causing the breakdown of the SiOx stop.

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ISO 690GLATTHAAR, Raphael, Beatriz CELA GREVEN, Tobias OKKER, Frank HUSTER, Giso HAHN, Barbara TERHEIDEN, 2023. Fundamental microscopic studies on the etching behavior of silver pastes on poly-Si/SiOx passivating contacts. In: Solar Energy Materials and Solar Cells. Elsevier. 2023, 261, 112516. ISSN 0927-0248. eISSN 1879-3398. Verfügbar unter: doi: 10.1016/j.solmat.2023.112516
BibTex
@article{Glatthaar2023Funda-67702,
  year={2023},
  doi={10.1016/j.solmat.2023.112516},
  title={Fundamental microscopic studies on the etching behavior of silver pastes on poly-Si/SiO<sub>x</sub> passivating contacts},
  volume={261},
  issn={0927-0248},
  journal={Solar Energy Materials and Solar Cells},
  author={Glatthaar, Raphael and Cela Greven, Beatriz and Okker, Tobias and Huster, Frank and Hahn, Giso and Terheiden, Barbara},
  note={Article Number: 112516}
}
RDF
<rdf:RDF
    xmlns:dcterms="http://purl.org/dc/terms/"
    xmlns:dc="http://purl.org/dc/elements/1.1/"
    xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
    xmlns:bibo="http://purl.org/ontology/bibo/"
    xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
    xmlns:foaf="http://xmlns.com/foaf/0.1/"
    xmlns:void="http://rdfs.org/ns/void#"
    xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > 
  <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/67702">
    <dcterms:abstract>Screen printing of Ag paste is a key process for implementing polycrystalline-silicon/silicon oxide (poly-Si/SiO&lt;sub&gt;x&lt;/sub&gt;) passivating contacts in industrial solar cells. Thereby, the formation of Ag crystallites on the Si surface is crucial for a low-ohmic contact. Recently, it has been observed that Ag crystallites are predominantly formed within the poly-Si layer and stop at the thermal SiO&lt;sub&gt;x&lt;/sub&gt;, thermal interface, causing a cuboidal shape. To avoid a direct contact of the Ag crystallites with the underlying SiO&lt;sub&gt;x&lt;/sub&gt;, thermal/crystalline-Si (c-Si) interface, a multilayer approach with interlayer SiO&lt;sub&gt;x&lt;/sub&gt;, &lt;sub&gt;inter&lt;/sub&gt; between several poly-Si layers is presented. A stack of three 50 nm poly-Si layers achieves highest cell potential. Further, the metallization process parameters are scanned to check when this cuboidal Ag crystallite shape occurs. While different amorphous-silicon (a-Si) deposition techniques show no changes, there are strong indications that the glass frit etching is responsible for a different etching mechanism causing the breakdown of the SiO&lt;sub&gt;x&lt;/sub&gt; stop.</dcterms:abstract>
    <dc:creator>Glatthaar, Raphael</dc:creator>
    <dc:contributor>Glatthaar, Raphael</dc:contributor>
    <dc:contributor>Hahn, Giso</dc:contributor>
    <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/67702/1/Glatthaar_2-10nt42hf4qr2q4.pdf"/>
    <dcterms:title>Fundamental microscopic studies on the etching behavior of silver pastes on poly-Si/SiO&lt;sub&gt;x&lt;/sub&gt; passivating contacts</dcterms:title>
    <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
    <dc:language>eng</dc:language>
    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2023-08-30T08:44:52Z</dc:date>
    <dc:contributor>Terheiden, Barbara</dc:contributor>
    <foaf:homepage rdf:resource="http://localhost:8080/"/>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dc:creator>Cela Greven, Beatriz</dc:creator>
    <dc:creator>Huster, Frank</dc:creator>
    <dc:creator>Hahn, Giso</dc:creator>
    <dc:contributor>Cela Greven, Beatriz</dc:contributor>
    <dcterms:issued>2023</dcterms:issued>
    <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2023-08-30T08:44:52Z</dcterms:available>
    <dc:creator>Okker, Tobias</dc:creator>
    <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/67702/1/Glatthaar_2-10nt42hf4qr2q4.pdf"/>
    <bibo:uri rdf:resource="https://kops.uni-konstanz.de/handle/123456789/67702"/>
    <dc:contributor>Okker, Tobias</dc:contributor>
    <dc:contributor>Huster, Frank</dc:contributor>
    <dc:creator>Terheiden, Barbara</dc:creator>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
  </rdf:Description>
</rdf:RDF>

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xmlui.Submission.submit.DescribeStep.inputForms.label.kops_note_fromSubmitter

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