Publikation: Colloid monolayers as versatile lithographic masks
Dateien
Datum
Autor:innen
Herausgeber:innen
ISSN der Zeitschrift
Electronic ISSN
ISBN
Bibliografische Daten
Verlag
Schriftenreihe
Auflagebezeichnung
URI (zitierfähiger Link)
DOI (zitierfähiger Link)
Internationale Patentnummer
Link zur Lizenz
Angaben zur Forschungsförderung
Projekt
Open Access-Veröffentlichung
Sammlungen
Core Facility der Universität Konstanz
Titel in einer weiteren Sprache
Publikationstyp
Publikationsstatus
Erschienen in
Zusammenfassung
Hexagonally closed packed monolayers of colloids have found more and more applications, e.g. as lithographic masks. The monolayers are usually produced with the help of a self-organizing process where a suspension of colloids is applied to the desired substrate and left to dry. This method requires a good wettability and smoothness of the substrate, which severely limits the number of possible substrates. We present a new method for the application of colloid monolayers to almost any surface where these difficulties are circumvented. At first the monolayers are fabricated on glass substrates and afterwards floated off on a water surface. From there, they are transferred to the desired substrate. Examples where transferred monolayers were used as lithographic masks are shown on glass, indium tin oxide, and tungsten diselenide. The transfer of a colloid monolayer to a copper grid for transmission electron microscopy demonstrates the applicability of the technique to curved surfaces as well.
Zusammenfassung in einer weiteren Sprache
Fachgebiet (DDC)
Schlagwörter
Konferenz
Rezension
Zitieren
ISO 690
BURMEISTER, Frank, Claudia SCHÄFLE, Thomas MATTHES, Matthias BÖHMISCH, Johannes BONEBERG, Paul LEIDERER, 1997. Colloid monolayers as versatile lithographic masks. In: Langmuir. 1997, 13(11), pp. 2983-2987. Available under: doi: 10.1021/la9621123BibTex
@article{Burmeister1997Collo-5089, year={1997}, doi={10.1021/la9621123}, title={Colloid monolayers as versatile lithographic masks}, number={11}, volume={13}, journal={Langmuir}, pages={2983--2987}, author={Burmeister, Frank and Schäfle, Claudia and Matthes, Thomas and Böhmisch, Matthias and Boneberg, Johannes and Leiderer, Paul} }
RDF
<rdf:RDF xmlns:dcterms="http://purl.org/dc/terms/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#" xmlns:foaf="http://xmlns.com/foaf/0.1/" xmlns:void="http://rdfs.org/ns/void#" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/5089"> <dcterms:title>Colloid monolayers as versatile lithographic masks</dcterms:title> <dc:contributor>Boneberg, Johannes</dc:contributor> <dc:creator>Burmeister, Frank</dc:creator> <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/5089"/> <dc:creator>Böhmisch, Matthias</dc:creator> <dc:creator>Boneberg, Johannes</dc:creator> <dc:contributor>Böhmisch, Matthias</dc:contributor> <dcterms:rights rdf:resource="http://creativecommons.org/licenses/by-nc-nd/2.0/"/> <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5089/1/192_lang_1997.pdf"/> <dc:creator>Matthes, Thomas</dc:creator> <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/> <dcterms:bibliographicCitation>First publ. in: Langmuir 13 (1997), 11, pp. 2983-2987</dcterms:bibliographicCitation> <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5089/1/192_lang_1997.pdf"/> <dc:contributor>Matthes, Thomas</dc:contributor> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:53:03Z</dcterms:available> <dcterms:issued>1997</dcterms:issued> <dc:language>eng</dc:language> <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/> <dc:contributor>Schäfle, Claudia</dc:contributor> <dc:rights>Attribution-NonCommercial-NoDerivs 2.0 Generic</dc:rights> <dc:format>application/pdf</dc:format> <dc:contributor>Burmeister, Frank</dc:contributor> <dc:contributor>Leiderer, Paul</dc:contributor> <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/> <dc:creator>Schäfle, Claudia</dc:creator> <dc:creator>Leiderer, Paul</dc:creator> <dcterms:abstract xml:lang="eng">Hexagonally closed packed monolayers of colloids have found more and more applications, e.g. as lithographic masks. The monolayers are usually produced with the help of a self-organizing process where a suspension of colloids is applied to the desired substrate and left to dry. This method requires a good wettability and smoothness of the substrate, which severely limits the number of possible substrates. We present a new method for the application of colloid monolayers to almost any surface where these difficulties are circumvented. At first the monolayers are fabricated on glass substrates and afterwards floated off on a water surface. From there, they are transferred to the desired substrate. Examples where transferred monolayers were used as lithographic masks are shown on glass, indium tin oxide, and tungsten diselenide. The transfer of a colloid monolayer to a copper grid for transmission electron microscopy demonstrates the applicability of the technique to curved surfaces as well.</dcterms:abstract> <foaf:homepage rdf:resource="http://localhost:8080/"/> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:53:03Z</dc:date> </rdf:Description> </rdf:RDF>