Publikation: Generation of Surface Energy Patterns by Single Pulse Laser Interference on Self-Assembled Monolayers
Lade...
Dateien
Datum
2008
Autor:innen
Herausgeber:innen
ISSN der Zeitschrift
Electronic ISSN
ISBN
Bibliografische Daten
Verlag
Schriftenreihe
Auflagebezeichnung
URI (zitierfähiger Link)
DOI (zitierfähiger Link)
Internationale Patentnummer
Link zur Lizenz
Angaben zur Forschungsförderung
Projekt
Open Access-Veröffentlichung
Open Access Green
Sammlungen
Core Facility der Universität Konstanz
Titel in einer weiteren Sprache
Publikationstyp
Zeitschriftenartikel
Publikationsstatus
Published
Erschienen in
Langmuir. 2008, 24, pp. 13155-13160. Available under: doi: 10.1021/la801812j
Zusammenfassung
Single pulse laser interference lithographie is used to structure self-assembled monolayers of thiols on gold. This structuring process is investigated by attenuated total reflection measurements, and a demixing process of a binary polymer blend is used to visualize the produced surface energy pattern. The lithography can be realized with different wavelengths (266, 532, and 1064 nm) which shows that the structuring is a thermal process. As a first demonstration of this process. structures down to 800 nm period and 300 nm width are fabricated.
Zusammenfassung in einer weiteren Sprache
Fachgebiet (DDC)
530 Physik
Schlagwörter
single pulse laser, interference lithography
Konferenz
Rezension
undefined / . - undefined, undefined
Zitieren
ISO 690
GELDHAUSER, Tobias, Paul LEIDERER, Johannes BONEBERG, Stefan WALHEIM, Thomas SCHIMMEL, 2008. Generation of Surface Energy Patterns by Single Pulse Laser Interference on Self-Assembled Monolayers. In: Langmuir. 2008, 24, pp. 13155-13160. Available under: doi: 10.1021/la801812jBibTex
@article{Geldhauser2008Gener-9397,
year={2008},
doi={10.1021/la801812j},
title={Generation of Surface Energy Patterns by Single Pulse Laser Interference on Self-Assembled Monolayers},
volume={24},
journal={Langmuir},
pages={13155--13160},
author={Geldhauser, Tobias and Leiderer, Paul and Boneberg, Johannes and Walheim, Stefan and Schimmel, Thomas}
}RDF
<rdf:RDF
xmlns:dcterms="http://purl.org/dc/terms/"
xmlns:dc="http://purl.org/dc/elements/1.1/"
xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
xmlns:bibo="http://purl.org/ontology/bibo/"
xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
xmlns:foaf="http://xmlns.com/foaf/0.1/"
xmlns:void="http://rdfs.org/ns/void#"
xmlns:xsd="http://www.w3.org/2001/XMLSchema#" >
<rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/9397">
<dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/9397/1/paper_374_langmuir_geldhauser2008.pdf"/>
<foaf:homepage rdf:resource="http://localhost:8080/"/>
<dc:creator>Boneberg, Johannes</dc:creator>
<void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
<dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
<dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/9397/1/paper_374_langmuir_geldhauser2008.pdf"/>
<dc:creator>Leiderer, Paul</dc:creator>
<dc:creator>Walheim, Stefan</dc:creator>
<dc:contributor>Leiderer, Paul</dc:contributor>
<dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T17:56:10Z</dcterms:available>
<dc:contributor>Walheim, Stefan</dc:contributor>
<dc:creator>Geldhauser, Tobias</dc:creator>
<dc:format>application/pdf</dc:format>
<dc:creator>Schimmel, Thomas</dc:creator>
<dc:language>eng</dc:language>
<dcterms:title>Generation of Surface Energy Patterns by Single Pulse Laser Interference on Self-Assembled Monolayers</dcterms:title>
<dcterms:issued>2008</dcterms:issued>
<dc:contributor>Schimmel, Thomas</dc:contributor>
<dcterms:abstract xml:lang="eng">Single pulse laser interference lithographie is used to structure self-assembled monolayers of thiols on gold. This structuring process is investigated by attenuated total reflection measurements, and a demixing process of a binary polymer blend is used to visualize the produced surface energy pattern. The lithography can be realized with different wavelengths (266, 532, and 1064 nm) which shows that the structuring is a thermal process. As a first demonstration of this process. structures down to 800 nm period and 300 nm width are fabricated.</dcterms:abstract>
<bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/9397"/>
<dc:contributor>Geldhauser, Tobias</dc:contributor>
<dcterms:rights rdf:resource="https://rightsstatements.org/page/InC/1.0/"/>
<dc:rights>terms-of-use</dc:rights>
<dcterms:bibliographicCitation>First publ. in: Langmuir, 24, 2008, S. 13155-13160</dcterms:bibliographicCitation>
<dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T17:56:10Z</dc:date>
<dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
<dc:contributor>Boneberg, Johannes</dc:contributor>
</rdf:Description>
</rdf:RDF>Interner Vermerk
xmlui.Submission.submit.DescribeStep.inputForms.label.kops_note_fromSubmitter
Prüfungsdatum der Dissertation
Finanzierungsart
Kommentar zur Publikation
Allianzlizenz
Corresponding Authors der Uni Konstanz vorhanden
Internationale Co-Autor:innen
Universitätsbibliographie
Ja
