Publikation:

A new KOH-etch solution to produce a random pyramid texture on monocrystalline silicon at elevated process temperatures and shortened process times

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Ximello_opus-103961.pdf
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2009

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Haverkamp, Helge

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http://nbn-resolving.de/urn:nbn:de:bsz:352-opus-103961
DOI (zitierfähiger Link)
https://doi.org/10.4229/24thEUPVSEC2009-2CV.5.70
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Published

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Proceedings of the 24th European PV SEC, Hamburg, 21 - 25 September 2009. München: WIP, 2009, pp. 1958-1960. ISBN 3-936338-25-6. Available under: doi: 10.4229/24thEUPVSEC2009-2CV.5.70

Zusammenfassung

Texturization of monocrystalline silicon for solar cells is still an issue due to the properties of the isopropyl alcohol (IPA) in the standard Potassium Hydroxide KOH (or Sodium Hydroxide NaOH)-IPA etching solution. The low boiling point of IPA (82.4oC) is limiting etch temperature and by this processing speed. Furthermore, IPA has other disadvantages like waste recycling problems. A better alternative for IPA, not only regarding processing time, is a High Boiling Alcohol (HBA). In this paper we show, that our newly found KOH-HBA texture also gives lower reflection results than our KOH-IPA texture. Finally, we produced solar cells with both textures and current-voltage measurements are compared.

Zusammenfassung in einer weiteren Sprache

Fachgebiet (DDC)
530 Physik

Schlagwörter

Texturization, Etching, Solar cells

Konferenz

24th European Photovoltaic Solar Energy Conference, 21. Sept. 2009 - 25. Sept. 2009, Hamburg
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ISO 690XIMELLO QUIEBRAS, Jose Nestor, Helge HAVERKAMP, Giso HAHN, 2009. A new KOH-etch solution to produce a random pyramid texture on monocrystalline silicon at elevated process temperatures and shortened process times. 24th European Photovoltaic Solar Energy Conference. Hamburg, 21. Sept. 2009 - 25. Sept. 2009. In: Proceedings of the 24th European PV SEC, Hamburg, 21 - 25 September 2009. München: WIP, 2009, pp. 1958-1960. ISBN 3-936338-25-6. Available under: doi: 10.4229/24thEUPVSEC2009-2CV.5.70
BibTex
@inproceedings{XimelloQuiebras2009KOHet-934,
  year={2009},
  doi={10.4229/24thEUPVSEC2009-2CV.5.70},
  title={A new KOH-etch solution to produce a random pyramid texture on monocrystalline silicon at elevated process temperatures and shortened process times},
  isbn={3-936338-25-6},
  publisher={WIP},
  address={München},
  booktitle={Proceedings of the 24th European PV SEC, Hamburg, 21 - 25 September 2009},
  pages={1958--1960},
  author={Ximello Quiebras, Jose Nestor and Haverkamp, Helge and Hahn, Giso}
}
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