Self‐Healing and Light‐Soaking in MAPbI3 : The Effect of H2O

dc.contributor.authorCeratti, Davide Raffaele
dc.contributor.authorTenne, Ron
dc.contributor.authorBartezzaghi, Andrea
dc.contributor.authorCremonesi, Llorenç
dc.contributor.authorSegev, Lior
dc.contributor.authorKalchenko, Vyacheslav
dc.contributor.authorOron, Dan
dc.contributor.authorPotenza, Marco Alberto Carlo
dc.contributor.authorHodes, Gary
dc.contributor.authorCahen, David
dc.date.accessioned2024-12-11T10:17:16Z
dc.date.available2024-12-11T10:17:16Z
dc.date.issued2022-09
dc.description.abstractThe future of halide perovskites (HaPs) is beclouded by limited understanding of their long‐term stability. While HaPs can be altered by radiation that induces multiple processes, they can also return to their original state by “self‐healing.” Here two‐photon (2P) absorption is used to effect light‐induced modifications within MAPbI3 single crystals. Then the changes in the photodamaged region are followed by measuring the photoluminescence, from 2P absorption with 2.5 orders of magnitude lower intensity than that used for photodamaging the MAPbI3. After photodamage, two brightening and one darkening process are found, all of which recover but on different timescales. The first two are attributed to trap‐filling (the fastest) and to proton‐amine‐related chemistry (the slowest), while photodamage is attributed to the lead‐iodide sublattice. Surprisingly, while after 2P‐irradiation of crystals that are stored in dry, inert ambient, photobrightening (or “light‐soaking”) occurs, mostly photodarkening is seen after photodamage in humid ambient, showing an important connection between the self‐healing of a HaP and the presence of H2O, for long‐term steady‐state illumination, practically no difference remains between samples kept in dry or humid environments. This result suggests that photobrightening requires a chemical‐reservoir that is sensitive to the presence of H2O, or possibly other proton‐related, particularly amine, chemistry.
dc.description.versionpublisheddeu
dc.identifier.doi10.1002/adma.202110239
dc.identifier.ppn1912025302
dc.identifier.urihttps://kops.uni-konstanz.de/handle/123456789/71645
dc.language.isoeng
dc.rightsAttribution-NonCommercial 4.0 International
dc.rights.urihttp://creativecommons.org/licenses/by-nc/4.0/
dc.subject.ddc530
dc.titleSelf‐Healing and Light‐Soaking in MAPbI<sub>3</sub> : The Effect of H<sub>2</sub>Oeng
dc.typeJOURNAL_ARTICLE
dspace.entity.typePublication
kops.citation.bibtex
@article{Ceratti2022-09SelfH-71645,
  year={2022},
  doi={10.1002/adma.202110239},
  title={Self‐Healing and Light‐Soaking in MAPbI<sub>3</sub> : The Effect of H<sub>2</sub>O},
  number={35},
  volume={34},
  issn={0935-9648},
  journal={Advanced Materials},
  author={Ceratti, Davide Raffaele and Tenne, Ron and Bartezzaghi, Andrea and Cremonesi, Llorenç and Segev, Lior and Kalchenko, Vyacheslav and Oron, Dan and Potenza, Marco Alberto Carlo and Hodes, Gary and Cahen, David},
  note={Article Number: 2110239}
}
kops.citation.iso690CERATTI, Davide Raffaele, Ron TENNE, Andrea BARTEZZAGHI, Llorenç CREMONESI, Lior SEGEV, Vyacheslav KALCHENKO, Dan ORON, Marco Alberto Carlo POTENZA, Gary HODES, David CAHEN, 2022. Self‐Healing and Light‐Soaking in MAPbI3 : The Effect of H2O. In: Advanced Materials. Wiley. 2022, 34(35), 2110239. ISSN 0935-9648. eISSN 1521-4095. Verfügbar unter: doi: 10.1002/adma.202110239deu
kops.citation.iso690CERATTI, Davide Raffaele, Ron TENNE, Andrea BARTEZZAGHI, Llorenç CREMONESI, Lior SEGEV, Vyacheslav KALCHENKO, Dan ORON, Marco Alberto Carlo POTENZA, Gary HODES, David CAHEN, 2022. Self‐Healing and Light‐Soaking in MAPbI3 : The Effect of H2O. In: Advanced Materials. Wiley. 2022, 34(35), 2110239. ISSN 0935-9648. eISSN 1521-4095. Available under: doi: 10.1002/adma.202110239eng
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kops.sourcefieldAdvanced Materials. Wiley. 2022, <b>34</b>(35), 2110239. ISSN 0935-9648. eISSN 1521-4095. Verfügbar unter: doi: 10.1002/adma.202110239deu
kops.sourcefield.plainAdvanced Materials. Wiley. 2022, 34(35), 2110239. ISSN 0935-9648. eISSN 1521-4095. Verfügbar unter: doi: 10.1002/adma.202110239deu
kops.sourcefield.plainAdvanced Materials. Wiley. 2022, 34(35), 2110239. ISSN 0935-9648. eISSN 1521-4095. Available under: doi: 10.1002/adma.202110239eng
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source.periodicalTitleAdvanced Materials
source.publisherWiley

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