Publikation: Triple-Point Wetting of Molecular Hydrogen on Tailored Substrates
Dateien
Datum
Autor:innen
Herausgeber:innen
ISSN der Zeitschrift
Electronic ISSN
ISBN
Bibliografische Daten
Verlag
Schriftenreihe
Auflagebezeichnung
URI (zitierfähiger Link)
DOI (zitierfähiger Link)
Internationale Patentnummer
Link zur Lizenz
Angaben zur Forschungsförderung
Projekt
Open Access-Veröffentlichung
Sammlungen
Core Facility der Universität Konstanz
Titel in einer weiteren Sprache
Publikationstyp
Publikationsstatus
Erschienen in
Zusammenfassung
Triple-point wetting is a well-known phenomenon of many simple adsorbates on solid substrates. It implies that in the liquid phase above the triple-point temperature, T3, complete wetting with the formation of arbitrarily thick films is observed, whereas below T3 only a few monolayers of the solid phase are adsorbed at saturated vapour pressure. This effect is usually ascribed to substrate-induced strain in the solid film, which occurs due to lattice mismatch and/or the strong van der Waals pressure in the first monolayers. Molecular hydrogen is a suitable system to investigate this phenomenon, in particular by tailoring the adsorbate-substrate interaction by means of thin preplating layers of other adsorbates, and by introducing disorder into the system by using not only the pure systems H2 and D2, but also mixtures thereof. In particular the dependence of T3 of the mixture on the mass ratio of its components is measured and deviations from the simple van der Waals law are discussed. The experiments show that triple-point wetting is a rather dominating effect, which in contrast to expectation persists even if the system parameters are widely varied, indicating that the present picture of this effect is incomplete.
Zusammenfassung in einer weiteren Sprache
Fachgebiet (DDC)
Schlagwörter
Konferenz
Rezension
Zitieren
ISO 690
SOHAILI, Masoud, Jürgen KLIER, Paul LEIDERER, 2001. Triple-Point Wetting of Molecular Hydrogen on Tailored Substrates. In: Journal of Low Temperature Physics. 2001, 122(3-4), pp. 249-255. Available under: doi: 10.1023/A:1004836431039BibTex
@article{Sohaili2001Tripl-4651,
year={2001},
doi={10.1023/A:1004836431039},
title={Triple-Point Wetting of Molecular Hydrogen on Tailored Substrates},
number={3-4},
volume={122},
journal={Journal of Low Temperature Physics},
pages={249--255},
author={Sohaili, Masoud and Klier, Jürgen and Leiderer, Paul}
}RDF
<rdf:RDF
xmlns:dcterms="http://purl.org/dc/terms/"
xmlns:dc="http://purl.org/dc/elements/1.1/"
xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
xmlns:bibo="http://purl.org/ontology/bibo/"
xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
xmlns:foaf="http://xmlns.com/foaf/0.1/"
xmlns:void="http://rdfs.org/ns/void#"
xmlns:xsd="http://www.w3.org/2001/XMLSchema#" >
<rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/4651">
<dc:language>eng</dc:language>
<dcterms:bibliographicCitation>First publ. in: Journal of Low Temperature Physics 122 (2001), 3-4, pp. 249-255</dcterms:bibliographicCitation>
<dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
<dc:contributor>Leiderer, Paul</dc:contributor>
<dc:rights>Attribution-NonCommercial-NoDerivs 2.0 Generic</dc:rights>
<void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
<dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/4651/1/286_jlowtempph_2001.pdf"/>
<dc:creator>Leiderer, Paul</dc:creator>
<bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/4651"/>
<foaf:homepage rdf:resource="http://localhost:8080/"/>
<dcterms:rights rdf:resource="http://creativecommons.org/licenses/by-nc-nd/2.0/"/>
<dc:creator>Klier, Jürgen</dc:creator>
<dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
<dcterms:issued>2001</dcterms:issued>
<dc:contributor>Klier, Jürgen</dc:contributor>
<dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:49:17Z</dcterms:available>
<dc:format>application/pdf</dc:format>
<dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:49:17Z</dc:date>
<dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/4651/1/286_jlowtempph_2001.pdf"/>
<dc:creator>Sohaili, Masoud</dc:creator>
<dcterms:title>Triple-Point Wetting of Molecular Hydrogen on Tailored Substrates</dcterms:title>
<dcterms:abstract xml:lang="eng">Triple-point wetting is a well-known phenomenon of many simple adsorbates on solid substrates. It implies that in the liquid phase above the triple-point temperature, T3, complete wetting with the formation of arbitrarily thick films is observed, whereas below T3 only a few monolayers of the solid phase are adsorbed at saturated vapour pressure. This effect is usually ascribed to substrate-induced strain in the solid film, which occurs due to lattice mismatch and/or the strong van der Waals pressure in the first monolayers. Molecular hydrogen is a suitable system to investigate this phenomenon, in particular by tailoring the adsorbate-substrate interaction by means of thin preplating layers of other adsorbates, and by introducing disorder into the system by using not only the pure systems H2 and D2, but also mixtures thereof. In particular the dependence of T3 of the mixture on the mass ratio of its components is measured and deviations from the simple van der Waals law are discussed. The experiments show that triple-point wetting is a rather dominating effect, which in contrast to expectation persists even if the system parameters are widely varied, indicating that the present picture of this effect is incomplete.</dcterms:abstract>
<dc:contributor>Sohaili, Masoud</dc:contributor>
</rdf:Description>
</rdf:RDF>
