Publikation: Interface Engineering to Create a Strong Spin Filter Contact to Silicon
Dateien
Datum
Autor:innen
Herausgeber:innen
ISSN der Zeitschrift
Electronic ISSN
ISBN
Bibliografische Daten
Verlag
Schriftenreihe
Auflagebezeichnung
URI (zitierfähiger Link)
DOI (zitierfähiger Link)
ArXiv-ID
Internationale Patentnummer
Link zur Lizenz
Angaben zur Forschungsförderung
Projekt
Open Access-Veröffentlichung
Sammlungen
Core Facility der Universität Konstanz
Titel in einer weiteren Sprache
Publikationstyp
Publikationsstatus
Erschienen in
Zusammenfassung
Integrating epitaxial and ferromagnetic Europium Oxide (EuO) directly on silicon is a perfect route to enrich silicon nanotechnology with spin filter functionality. To date, the inherent chemical reactivity between EuO and Si has prevented a heteroepitaxial integration without significant contaminations of the interface with Eu silicides and Si oxides. We present a solution to this long-standing problem by applying two complementary passivation techniques for the reactive EuO/Si interface: (i) an in situ hydrogen-Si (001) passivation and (ii) the application of oxygen-protective Eu monolayers-without using any additional buffer layers. By careful chemical depth profiling of the oxide-semiconductor interface via hard x-ray photoemission spectroscopy, we show how to systematically minimize both Eu silicide and Si oxide formation to the sub-monolayer regime-and how to ultimately interface-engineer chemically clean, heteroepitaxial and ferromagnetic EuO/Si (001) in order to create a strong spin filter contact to silicon.
Zusammenfassung in einer weiteren Sprache
Fachgebiet (DDC)
Schlagwörter
Konferenz
Rezension
Zitieren
ISO 690
CASPERS, Christian, Andrei GLOSKOVSKII, Mihaela GORGOI, Claire BESSON, Martina LUYSBERG, Konstantin Z. RUSHCHANSKII, Marjana LEŽAIĆ, Charles S. FADLEY, Wolfgang DRUBE, Martina MÜLLER, 2016. Interface Engineering to Create a Strong Spin Filter Contact to Silicon. In: Scientific reports. Springer Nature. 2016, 6(1), 22912. eISSN 2045-2322. Available under: doi: 10.1038/srep22912BibTex
@article{Caspers2016-03-15Inter-49987, year={2016}, doi={10.1038/srep22912}, title={Interface Engineering to Create a Strong Spin Filter Contact to Silicon}, number={1}, volume={6}, journal={Scientific reports}, author={Caspers, Christian and Gloskovskii, Andrei and Gorgoi, Mihaela and Besson, Claire and Luysberg, Martina and Rushchanskii, Konstantin Z. and Ležaić, Marjana and Fadley, Charles S. and Drube, Wolfgang and Müller, Martina}, note={11 pages of scientific paper, 10 high-resolution color figures. Supplemental information on the thermodynamic problem available (PDF). High-resolution abstract graphic available (PNG). Original research (2016) Article Number: 22912} }
RDF
<rdf:RDF xmlns:dcterms="http://purl.org/dc/terms/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#" xmlns:foaf="http://xmlns.com/foaf/0.1/" xmlns:void="http://rdfs.org/ns/void#" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/49987"> <dc:language>eng</dc:language> <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/> <foaf:homepage rdf:resource="http://localhost:8080/"/> <dc:contributor>Luysberg, Martina</dc:contributor> <dc:creator>Caspers, Christian</dc:creator> <dcterms:abstract xml:lang="eng">Integrating epitaxial and ferromagnetic Europium Oxide (EuO) directly on silicon is a perfect route to enrich silicon nanotechnology with spin filter functionality. To date, the inherent chemical reactivity between EuO and Si has prevented a heteroepitaxial integration without significant contaminations of the interface with Eu silicides and Si oxides. We present a solution to this long-standing problem by applying two complementary passivation techniques for the reactive EuO/Si interface: (i) an in situ hydrogen-Si (001) passivation and (ii) the application of oxygen-protective Eu monolayers-without using any additional buffer layers. By careful chemical depth profiling of the oxide-semiconductor interface via hard x-ray photoemission spectroscopy, we show how to systematically minimize both Eu silicide and Si oxide formation to the sub-monolayer regime-and how to ultimately interface-engineer chemically clean, heteroepitaxial and ferromagnetic EuO/Si (001) in order to create a strong spin filter contact to silicon.</dcterms:abstract> <dcterms:issued>2016-03-15</dcterms:issued> <dc:creator>Luysberg, Martina</dc:creator> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2020-06-24T09:19:46Z</dcterms:available> <dc:creator>Gloskovskii, Andrei</dc:creator> <dc:contributor>Gorgoi, Mihaela</dc:contributor> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2020-06-24T09:19:46Z</dc:date> <dcterms:title>Interface Engineering to Create a Strong Spin Filter Contact to Silicon</dcterms:title> <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/> <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/> <dc:contributor>Fadley, Charles S.</dc:contributor> <dc:contributor>Ležaić, Marjana</dc:contributor> <dc:contributor>Besson, Claire</dc:contributor> <bibo:uri rdf:resource="https://kops.uni-konstanz.de/handle/123456789/49987"/> <dc:contributor>Müller, Martina</dc:contributor> <dc:contributor>Gloskovskii, Andrei</dc:contributor> <dc:creator>Besson, Claire</dc:creator> <dcterms:rights rdf:resource="http://creativecommons.org/licenses/by/4.0/"/> <dc:contributor>Rushchanskii, Konstantin Z.</dc:contributor> <dc:creator>Fadley, Charles S.</dc:creator> <dc:contributor>Drube, Wolfgang</dc:contributor> <dc:contributor>Caspers, Christian</dc:contributor> <dc:creator>Müller, Martina</dc:creator> <dc:creator>Ležaić, Marjana</dc:creator> <dc:creator>Drube, Wolfgang</dc:creator> <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/49987/3/Caspers_2-1sz2jgflbuwix5.pdf"/> <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/49987/3/Caspers_2-1sz2jgflbuwix5.pdf"/> <dc:creator>Rushchanskii, Konstantin Z.</dc:creator> <dc:rights>Attribution 4.0 International</dc:rights> <dc:creator>Gorgoi, Mihaela</dc:creator> </rdf:Description> </rdf:RDF>