Publikation: Infrared steam laser cleaning
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2008
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Applied Physics / A, Materials Science and Processing. 2008, 93(1), pp. 1-4. Available under: doi: 10.1007/s00339-008-4651-7
Zusammenfassung
Steam Laser Cleaning with a pulsed infrared laser source is investigated. The infrared light is tuned to the absorption maximum of water (λ = 2.94 µm, 10 ns), whereas the substrates used are transparent (glass, silicon). Thus a thin liquid water layer condensed on top of the contaminated substrate is rapidly heated. The pressure generated during the subsequent phase explosion generates a cleaning force which exceeds the adhesion of the particles. We examine the cleaning threshold in single shot experiments for particles sized from 1 µm down to 300 nm.
Zusammenfassung in einer weiteren Sprache
Fachgebiet (DDC)
530 Physik
Schlagwörter
Infrared, steam laser, cleaning
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FRANK, Pascal, Florian LANG, Mario MOSBACHER, Johannes BONEBERG, Paul LEIDERER, 2008. Infrared steam laser cleaning. In: Applied Physics / A, Materials Science and Processing. 2008, 93(1), pp. 1-4. Available under: doi: 10.1007/s00339-008-4651-7BibTex
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title={Infrared steam laser cleaning},
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journal={Applied Physics / A, Materials Science and Processing},
pages={1--4},
author={Frank, Pascal and Lang, Florian and Mosbacher, Mario and Boneberg, Johannes and Leiderer, Paul}
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