Plasma texturing and its influence on surface passivation
| dc.contributor.author | Groetschel, Daniela | deu |
| dc.contributor.author | Junge, Johannes | |
| dc.contributor.author | Käs, Martin | deu |
| dc.contributor.author | Zuschlag, Annika | |
| dc.contributor.author | Hahn, Giso | |
| dc.date.accessioned | 2011-03-22T17:51:41Z | deu |
| dc.date.available | 2011-03-22T17:51:41Z | deu |
| dc.date.issued | 2008 | deu |
| dc.description.abstract | In this paper a proof of concept of a plasma texture developed for solar cell processing is presented. Currently the implementation of this step into standard cell processes is limited by the uniformity of the etching results. It was, however, successfully introduced into a photolithography based process for 2x2 cm²-cells, leading to a benefit in efficiency of up to 1%abs compared to untextured samples. The combination with emitter passivation by thermal oxide on the front side both steps apart from each other leading to an improvement of cell data shows a degradation of the effective diffusion length. This detrimental effect is assigned to defects generated at high oxidation or firing temperatures and demands further investigation and adjustment of the processing steps. | eng |
| dc.description.version | published | |
| dc.identifier.citation | The compiled state-of-the-art of PV solar technology and deployment : 23rd European Photovoltaic Solar Energy Conference, EU PVSEC, Valencia, Spain, 1 - 5 September 2008 ; proceedings / Ed. by: D. Lincot ... Munich : WIP-Renewable Energies, 2008, pp. 1534-1536 | deu |
| dc.identifier.doi | 10.4229/23rdEUPVSEC2008-2CV.4.62 | |
| dc.identifier.ppn | 508218330 | |
| dc.identifier.uri | http://kops.uni-konstanz.de/handle/123456789/879 | |
| dc.language.iso | eng | deu |
| dc.legacy.dateIssued | 2010 | deu |
| dc.rights | terms-of-use | |
| dc.rights.uri | https://rightsstatements.org/page/InC/1.0/ | |
| dc.subject | texturisation | deu |
| dc.subject | plasma etching | deu |
| dc.subject | passivation | deu |
| dc.subject.ddc | 530 | deu |
| dc.title | Plasma texturing and its influence on surface passivation | eng |
| dc.type | INPROCEEDINGS | deu |
| dspace.entity.type | Publication | |
| kops.citation.bibtex | @inproceedings{Groetschel2008Plasm-879,
year={2008},
doi={10.4229/23rdEUPVSEC2008-2CV.4.62},
title={Plasma texturing and its influence on surface passivation},
publisher={WIP-Renewable Energies},
address={Munich, Germany},
booktitle={The compiled state-of-the-art of PV solar technology and deployment : 23rd European Photovoltaic Solar Energy Conference},
pages={1534--1536},
editor={Lincot, D.},
author={Groetschel, Daniela and Junge, Johannes and Käs, Martin and Zuschlag, Annika and Hahn, Giso}
} | |
| kops.citation.iso690 | GROETSCHEL, Daniela, Johannes JUNGE, Martin KÄS, Annika ZUSCHLAG, Giso HAHN, 2008. Plasma texturing and its influence on surface passivation. 23rd European Photovoltaic Solar Energy Conference, EU PVSEC. Valencia, Spain, 1. Sept. 2008 - 5. Sept. 2008. In: LINCOT, D., ed. and others. The compiled state-of-the-art of PV solar technology and deployment : 23rd European Photovoltaic Solar Energy Conference. Munich, Germany: WIP-Renewable Energies, 2008, pp. 1534-1536. Available under: doi: 10.4229/23rdEUPVSEC2008-2CV.4.62 | deu |
| kops.citation.iso690 | GROETSCHEL, Daniela, Johannes JUNGE, Martin KÄS, Annika ZUSCHLAG, Giso HAHN, 2008. Plasma texturing and its influence on surface passivation. 23rd European Photovoltaic Solar Energy Conference, EU PVSEC. Valencia, Spain, Sep 1, 2008 - Sep 5, 2008. In: LINCOT, D., ed. and others. The compiled state-of-the-art of PV solar technology and deployment : 23rd European Photovoltaic Solar Energy Conference. Munich, Germany: WIP-Renewable Energies, 2008, pp. 1534-1536. Available under: doi: 10.4229/23rdEUPVSEC2008-2CV.4.62 | eng |
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