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Surface-state electrons on a hydrogen film (I) : annealing of the film

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1991

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Kono, Kimitoshi
Albrecht, Uwe

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Journal of Low Temperature Physics. 1991, 82, pp. 279-293

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We have investigated the surface of thin films (thickness ~2 mm) of solid H2 between 1.5 and 4.2K by measuring the ac conductivity of surface-state electrons (SSE). The films were prepared on a glass substrate by quench condensation at 1.5 K and were therefore initially strongly disordered. In fact the surface of the virgin films before any heat treatment was so rough that no current due to SSE could be observed. Annealing the films decreased the surface roughness and gave rise to a thermal-activation-type temperature dependence of the SSE conductivity. By proper heat treatment up to 8 K the activation energy could be reduced to 10kB.

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ISO 690KONO, Kimitoshi, Uwe ALBRECHT, Paul LEIDERER, 1991. Surface-state electrons on a hydrogen film (I) : annealing of the film. In: Journal of Low Temperature Physics. 1991, 82, pp. 279-293
BibTex
@article{Kono1991Surfa-9124,
  year={1991},
  title={Surface-state electrons on a hydrogen film (I) : annealing of the film},
  volume={82},
  journal={Journal of Low Temperature Physics},
  pages={279--293},
  author={Kono, Kimitoshi and Albrecht, Uwe and Leiderer, Paul}
}
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