Publikation: Selective Emitter for Industrial Solar Cell Production : A Wet Chemical Approach Using a Single Side Diffusion Process
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2008
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LINCOT, D., ed. and others. The compiled state-of-the-art of PV solar technology and deployment : 23rd European Photovoltaic Solar Energy Conference. München: WIP Renewable Energies, 2008, pp. 1197-1199. Available under: doi: 10.4229/23rdEUPVSEC2008-2DO.3.3
Zusammenfassung
This work describes the implementation of a novel process for a single diffusion selective emitter fabrication on mono- and multicrystalline silicon solar cells. To create a selective emitter structure a wet chemical route for an emitter etch back process has been applied. The areas of the wafer that are intended for front side metallization are shielded from etching by an acid resistant etch barrier. The emitter etch back and the removing of the etch barrier are implemented by a wet chemical process. By means of successfully transferring the described selective emitter structure on a standard screen printed cell process an increase of efficiency of more than 0.3 %abs. has been achieved.
Zusammenfassung in einer weiteren Sprache
Fachgebiet (DDC)
530 Physik
Schlagwörter
selective emitter, single diffusion process, emitter etching
Konferenz
23rd European Photovoltaic Solar Energy Conference, EU PVSEC, 1. Sept. 2008 - 5. Sept. 2008, Valencia, Spain
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ISO 690
DASTGHEIB-SHIRAZI, Amir, Helge HAVERKAMP, Bernd RAABE, Felix BOOK, Giso HAHN, 2008. Selective Emitter for Industrial Solar Cell Production : A Wet Chemical Approach Using a Single Side Diffusion Process. 23rd European Photovoltaic Solar Energy Conference, EU PVSEC. Valencia, Spain, 1. Sept. 2008 - 5. Sept. 2008. In: LINCOT, D., ed. and others. The compiled state-of-the-art of PV solar technology and deployment : 23rd European Photovoltaic Solar Energy Conference. München: WIP Renewable Energies, 2008, pp. 1197-1199. Available under: doi: 10.4229/23rdEUPVSEC2008-2DO.3.3BibTex
@inproceedings{DastgheibShirazi2008Selec-968,
year={2008},
doi={10.4229/23rdEUPVSEC2008-2DO.3.3},
title={Selective Emitter for Industrial Solar Cell Production : A Wet Chemical Approach Using a Single Side Diffusion Process},
publisher={WIP Renewable Energies},
address={München},
booktitle={The compiled state-of-the-art of PV solar technology and deployment : 23rd European Photovoltaic Solar Energy Conference},
pages={1197--1199},
editor={Lincot, D.},
author={Dastgheib-Shirazi, Amir and Haverkamp, Helge and Raabe, Bernd and Book, Felix and Hahn, Giso}
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<dcterms:abstract xml:lang="eng">This work describes the implementation of a novel process for a single diffusion selective emitter fabrication on mono- and multicrystalline silicon solar cells. To create a selective emitter structure a wet chemical route for an emitter etch back process has been applied. The areas of the wafer that are intended for front side metallization are shielded from etching by an acid resistant etch barrier. The emitter etch back and the removing of the etch barrier are implemented by a wet chemical process. By means of successfully transferring the described selective emitter structure on a standard screen printed cell process an increase of efficiency of more than 0.3 %abs. has been achieved.</dcterms:abstract>
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