Ultrathin magnetic oxide EuO films on Si(001) using SiOx passivation : Controlled by hard x-ray photoemission spectroscopy

Kurzanzeige
dc.contributor.authorCaspers, Christian
dc.contributor.authorFlade, Stanley
dc.contributor.authorGorgoi, Mihaela
dc.contributor.authorGloskovskii, Andrei
dc.contributor.authorDrube, Wolfgang
dc.contributor.authorSchneider, Claus M.
dc.contributor.authorMüller, Martina
dc.date.accessioned2020-05-28T07:14:14Z
dc.date.available2020-05-28T07:14:14Z
dc.date.issued2013-05-07eng
dc.description.abstractWe present the chemical and structural optimization of ultrathin magnetic oxide EuO films on silicon. By applying a controlled in situ passivation of the Si(001) surface with SiOx in the monolayer regime, metallic silicide contaminations at the interface can be effectively reduced down to a sub-monolayer coverage, as was carefully quantified by interface-sensitive hard x-ray photoemission spectroscopy. Heteroepitaxial growth of EuO on Si(001) is sustained for this ultrathin SiOx-passivation, and bulk-near magnetic properties are observed for the 4 nm-thin EuO films. Our successful combination of chemically and structurally optimized EuO/Si(001) heterostructures by ultrathin in situ SiOx passivation makes this system promising for an application as alternative spin functional tunnel contacts in spin-FETs.eng
dc.description.versionpublishedeng
dc.identifier.doi10.1063/1.4795010eng
dc.identifier.urihttps://kops.uni-konstanz.de/handle/123456789/49700
dc.language.isoengeng
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dc.subject.ddc530eng
dc.titleUltrathin magnetic oxide EuO films on Si(001) using SiO<sub>x</sub> passivation : Controlled by hard x-ray photoemission spectroscopyeng
dc.typeJOURNAL_ARTICLEeng
dspace.entity.typePublication
kops.citation.bibtex
@article{Caspers2013-05-07Ultra-49700,
  year={2013},
  doi={10.1063/1.4795010},
  title={Ultrathin magnetic oxide EuO films on Si(001) using SiO<sub>x</sub> passivation : Controlled by hard x-ray photoemission spectroscopy},
  number={17},
  volume={113},
  issn={0021-8979},
  journal={Journal of Applied Physics},
  author={Caspers, Christian and Flade, Stanley and Gorgoi, Mihaela and Gloskovskii, Andrei and Drube, Wolfgang and Schneider, Claus M. and Müller, Martina},
  note={Article Number: 17C505}
}
kops.citation.iso690CASPERS, Christian, Stanley FLADE, Mihaela GORGOI, Andrei GLOSKOVSKII, Wolfgang DRUBE, Claus M. SCHNEIDER, Martina MÜLLER, 2013. Ultrathin magnetic oxide EuO films on Si(001) using SiOx passivation : Controlled by hard x-ray photoemission spectroscopy. In: Journal of Applied Physics. American Institute of Physics (AIP). 2013, 113(17), 17C505. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.4795010deu
kops.citation.iso690CASPERS, Christian, Stanley FLADE, Mihaela GORGOI, Andrei GLOSKOVSKII, Wolfgang DRUBE, Claus M. SCHNEIDER, Martina MÜLLER, 2013. Ultrathin magnetic oxide EuO films on Si(001) using SiOx passivation : Controlled by hard x-ray photoemission spectroscopy. In: Journal of Applied Physics. American Institute of Physics (AIP). 2013, 113(17), 17C505. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.4795010eng
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kops.sourcefieldJournal of Applied Physics. American Institute of Physics (AIP). 2013, <b>113</b>(17), 17C505. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.4795010deu
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kops.sourcefield.plainJournal of Applied Physics. American Institute of Physics (AIP). 2013, 113(17), 17C505. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.4795010eng
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source.identifier.eissn1089-7550eng
source.identifier.issn0021-8979eng
source.periodicalTitleJournal of Applied Physicseng
source.publisherAmerican Institute of Physics (AIP)eng

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