@inproceedings{Herguth2022impac-59065,
  year={2022},
  doi={10.1063/5.0089293},
  title={On the impact of substrate contact resistance in bifacial MIS-type lifetime structures},
  number={2487,1},
  isbn={978-0-7354-4362-4},
  issn={0094-243X},
  publisher={AIP Publishing},
  address={Melville, New York},
  series={AIP Conference Proceedings},
  booktitle={SiliconPV 2021, The 11th International Conference on Crystalline Silicon Photovoltaics},
  editor={Brendel, Rolf},
  author={Herguth, Axel and Kostrzewa, Fabian and Sperber, David},
  note={Article Number: 050002}
}

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    <dc:creator>Herguth, Axel</dc:creator>
    <dc:creator>Kostrzewa, Fabian</dc:creator>
    <dc:contributor>Kostrzewa, Fabian</dc:contributor>
    <dc:contributor>Sperber, David</dc:contributor>
    <dc:language>eng</dc:language>
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    <dc:creator>Sperber, David</dc:creator>
    <dcterms:title>On the impact of substrate contact resistance in bifacial MIS-type lifetime structures</dcterms:title>
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    <dc:contributor>Herguth, Axel</dc:contributor>
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    <dcterms:abstract xml:lang="eng">Bifacial metal-insulator-semiconductor (MIS) structures are used to intentionally manipulate field-effect passivation of dielectric layers on crystalline silicon substrates during lifetime measurements by external biasing. It is found that the impact of biasing on surface passivation depends on the quality of the substrate contact, in particular in asymmetric front/rear biasing conditions. A mathematical model is presented and used to demonstrate the problems arising from a high substrate contact resistance.</dcterms:abstract>
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