Publikation: Surface Texturing for Silicon Solar Cell Application Using ICP-PECVD Plasma Technique
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2015
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31st European Photovoltaic Solar Energy Conference and Exhibition : proceedings of the international conference held in Hamburg, Germany, 14 September - 18 September 2015. München: WIP, 2015, pp. 776-778. ISBN 3-936338-39-6. Available under: doi: 10.4229/EUPVSEC20152015-2AV.3.27
Zusammenfassung
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Fachgebiet (DDC)
530 Physik
Schlagwörter
PECVD, plasma texturing, NF3, boron, contact resistance
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31st European Photovoltaic Solar Energy Conference and Exhibition, 14. Sept. 2015 - 18. Sept. 2015, Hamburg
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FREY, Alexander, Josh ENGELHARDT, Jan EBSER, Giso HAHN, Barbara TERHEIDEN, 2015. Surface Texturing for Silicon Solar Cell Application Using ICP-PECVD Plasma Technique. 31st European Photovoltaic Solar Energy Conference and Exhibition. Hamburg, 14. Sept. 2015 - 18. Sept. 2015. In: 31st European Photovoltaic Solar Energy Conference and Exhibition : proceedings of the international conference held in Hamburg, Germany, 14 September - 18 September 2015. München: WIP, 2015, pp. 776-778. ISBN 3-936338-39-6. Available under: doi: 10.4229/EUPVSEC20152015-2AV.3.27BibTex
@inproceedings{Frey2015Surfa-34590, year={2015}, doi={10.4229/EUPVSEC20152015-2AV.3.27}, title={Surface Texturing for Silicon Solar Cell Application Using ICP-PECVD Plasma Technique}, isbn={3-936338-39-6}, publisher={WIP}, address={München}, booktitle={31st European Photovoltaic Solar Energy Conference and Exhibition : proceedings of the international conference held in Hamburg, Germany, 14 September - 18 September 2015}, pages={776--778}, author={Frey, Alexander and Engelhardt, Josh and Ebser, Jan and Hahn, Giso and Terheiden, Barbara} }
RDF
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