Publikation:

Ultrasonic Attenuation in Fused Silicia at High Frequencies and Low Temperatures

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1972

Autor:innen

Arnold, W.
Berberich, Paul
Hunklinger, Siegfried
Nava, R.

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http://nbn-resolving.de/urn:nbn:de:bsz:352-opus-27727
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Published

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Conference Internationale sur la diffusion des Phonons dans les solides, Paris, 1972. 1972, pp. 359-363

Zusammenfassung

Measurements of the attenuation of longitudinal and transverse sound waves of frequencies between 30 MHz and 29 GHz were carried out at temperatures from 1.1 K to 10 K in fused silica. In the upper temperature sange the attenuation can be described by relaxation processes. The absorption at lower temperature is compared with current theories. It is found that our high frequency data are not in a satisfactory agreement with these theories.

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530 Physik

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ISO 690ARNOLD, W., Joseph BAUMANN, Paul BERBERICH, Siegfried HUNKLINGER, Paul LEIDERER, R. NAVA, Klaus DRANSFELD, 1972. Ultrasonic Attenuation in Fused Silicia at High Frequencies and Low Temperatures. In: Conference Internationale sur la diffusion des Phonons dans les solides, Paris, 1972. 1972, pp. 359-363
BibTex
@inproceedings{Arnold1972Ultra-9041,
  year={1972},
  title={Ultrasonic Attenuation in Fused Silicia at High Frequencies and Low Temperatures},
  booktitle={Conference Internationale sur la diffusion des Phonons dans les solides, Paris, 1972},
  pages={359--363},
  author={Arnold, W. and Baumann, Joseph and Berberich, Paul and Hunklinger, Siegfried and Leiderer, Paul and Nava, R. and Dransfeld, Klaus}
}
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