From mesoscopic to nanoscopic surface structures : lithography with colloid monolayers

dc.contributor.authorBurmeister, Frankdeu
dc.contributor.authorSchäfle, Claudiadeu
dc.contributor.authorKeilhofer, Bettinadeu
dc.contributor.authorBechinger, Clemens
dc.contributor.authorBoneberg, Johannes
dc.contributor.authorLeiderer, Paul
dc.date.accessioned2011-03-24T14:52:46Zdeu
dc.date.available2011-03-24T14:52:46Zdeu
dc.date.issued1998deu
dc.description.versionpublished
dc.format.mimetypeapplication/pdfdeu
dc.identifier.citationFirst publ. in: Advanced Materials 10 (1998), 6, pp. 495-497deu
dc.identifier.doi10.1002/(SICI)1521-4095(199804)10:6<495::AID-ADMA495>3.0.CO;2-A
dc.identifier.ppn265170842deu
dc.identifier.urihttp://kops.uni-konstanz.de/handle/123456789/5053
dc.language.isoengdeu
dc.legacy.dateIssued2007deu
dc.rightsAttribution-NonCommercial-NoDerivs 2.0 Generic
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/
dc.subject.ddc530deu
dc.titleFrom mesoscopic to nanoscopic surface structures : lithography with colloid monolayerseng
dc.typeJOURNAL_ARTICLEdeu
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@article{Burmeister1998mesos-5053,
  year={1998},
  doi={10.1002/(SICI)1521-4095(199804)10:6<495::AID-ADMA495>3.0.CO;2-A},
  title={From mesoscopic to nanoscopic surface structures : lithography with colloid monolayers},
  number={6},
  volume={10},
  journal={Advanced Materials},
  pages={495--497},
  author={Burmeister, Frank and Schäfle, Claudia and Keilhofer, Bettina and Bechinger, Clemens and Boneberg, Johannes and Leiderer, Paul}
}
kops.citation.iso690BURMEISTER, Frank, Claudia SCHÄFLE, Bettina KEILHOFER, Clemens BECHINGER, Johannes BONEBERG, Paul LEIDERER, 1998. From mesoscopic to nanoscopic surface structures : lithography with colloid monolayers. In: Advanced Materials. 1998, 10(6), pp. 495-497. Available under: doi: 10.1002/(SICI)1521-4095(199804)10:6<495::AID-ADMA495>3.0.CO;2-Adeu
kops.citation.iso690BURMEISTER, Frank, Claudia SCHÄFLE, Bettina KEILHOFER, Clemens BECHINGER, Johannes BONEBERG, Paul LEIDERER, 1998. From mesoscopic to nanoscopic surface structures : lithography with colloid monolayers. In: Advanced Materials. 1998, 10(6), pp. 495-497. Available under: doi: 10.1002/(SICI)1521-4095(199804)10:6<495::AID-ADMA495>3.0.CO;2-Aeng
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