Publikation:

Equilibrium helium films under the influence of surface roughness

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paper_343_J.of.Low.Temp.Phys_klier_zech_fubel_leiderer2005.pdf
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Datum

2005

Autor:innen

Klier, Jürgen
Zech, Martin
Fubel, Armin
Shikin, Valeri

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http://nbn-resolving.de/urn:nbn:de:bsz:352-opus-27240
DOI (zitierfähiger Link)
https://doi.org/10.1007/s10909-005-1577-8
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Attribution-NonCommercial-NoDerivs 2.0 Generic

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Open Access Green

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Published

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Journal of Low Temperature Physics. 2005, 138(1-2), pp. 355-360. Available under: doi: 10.1007/s10909-005-1577-8

Zusammenfassung

Equilibrium helium flms adsorbed on solid substrates are investigated. Due to their thickness these flms are mainly in the retardation regime where the influence of the roughness of the substrates, ±(x), can be strong enough to be observed. For the definition of ±(x) we use a simple corrugation model. This model is supported by experimental results using the surface plasmon resonance technique to determine the thickness of helium flms grown on diferent Ag surfaces.

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530 Physik

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ISO 690KLIER, Jürgen, Martin ZECH, Armin FUBEL, Paul LEIDERER, Valeri SHIKIN, 2005. Equilibrium helium films under the influence of surface roughness. In: Journal of Low Temperature Physics. 2005, 138(1-2), pp. 355-360. Available under: doi: 10.1007/s10909-005-1577-8
BibTex
@article{Klier2005Equil-5297,
  year={2005},
  doi={10.1007/s10909-005-1577-8},
  title={Equilibrium helium films under the influence of surface roughness},
  number={1-2},
  volume={138},
  journal={Journal of Low Temperature Physics},
  pages={355--360},
  author={Klier, Jürgen and Zech, Martin and Fubel, Armin and Leiderer, Paul and Shikin, Valeri}
}
RDF
<rdf:RDF
    xmlns:dcterms="http://purl.org/dc/terms/"
    xmlns:dc="http://purl.org/dc/elements/1.1/"
    xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
    xmlns:bibo="http://purl.org/ontology/bibo/"
    xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
    xmlns:foaf="http://xmlns.com/foaf/0.1/"
    xmlns:void="http://rdfs.org/ns/void#"
    xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > 
  <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/5297">
    <dc:creator>Zech, Martin</dc:creator>
    <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5297/1/paper_343_J.of.Low.Temp.Phys_klier_zech_fubel_leiderer2005.pdf"/>
    <dc:creator>Leiderer, Paul</dc:creator>
    <dcterms:bibliographicCitation>First publ. in: Journal of Low Temperature Physics 138 (2005), 1-2, pp. 355-360</dcterms:bibliographicCitation>
    <dc:contributor>Leiderer, Paul</dc:contributor>
    <dcterms:issued>2005</dcterms:issued>
    <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/5297"/>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dc:creator>Klier, Jürgen</dc:creator>
    <dcterms:rights rdf:resource="http://creativecommons.org/licenses/by-nc-nd/2.0/"/>
    <dc:contributor>Klier, Jürgen</dc:contributor>
    <dc:contributor>Fubel, Armin</dc:contributor>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
    <dc:language>eng</dc:language>
    <dc:format>application/pdf</dc:format>
    <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:54:44Z</dcterms:available>
    <dc:creator>Shikin, Valeri</dc:creator>
    <dc:contributor>Zech, Martin</dc:contributor>
    <dc:contributor>Shikin, Valeri</dc:contributor>
    <dc:creator>Fubel, Armin</dc:creator>
    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:54:44Z</dc:date>
    <dcterms:abstract xml:lang="eng">Equilibrium helium flms adsorbed on solid substrates are investigated. Due to their thickness these flms are mainly in the retardation regime where the influence of the roughness of the substrates, ±(x), can be strong enough to be observed. For the definition of ±(x) we use a simple corrugation model. This model is supported by experimental results using the surface plasmon resonance technique to determine the thickness of helium flms grown on diferent Ag surfaces.</dcterms:abstract>
    <dc:rights>Attribution-NonCommercial-NoDerivs 2.0 Generic</dc:rights>
    <foaf:homepage rdf:resource="http://localhost:8080/"/>
    <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5297/1/paper_343_J.of.Low.Temp.Phys_klier_zech_fubel_leiderer2005.pdf"/>
    <dcterms:title>Equilibrium helium films under the influence of surface roughness</dcterms:title>
  </rdf:Description>
</rdf:RDF>

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xmlui.Submission.submit.DescribeStep.inputForms.label.kops_note_fromSubmitter

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