Publikation:

Oxidation of deposited Aun (n = 2-13) on Si02 /Si : influence of the NaOH(aq) treatment

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20110128_093940.pdf
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2009

Autor:innen

Lim, Dong Chan
Dietsche, Rainer
Kim, Young Dok

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http://nbn-resolving.de/urn:nbn:de:bsz:352-opus-128859
DOI (zitierfähiger Link)
https://doi.org/10.1016/j.chemphys.2009.03.023
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Physik: Publikationen
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Published

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Chemical physics. 2009, 359(1-3), pp. 161-165. Available under: doi: 10.1016/j.chemphys.2009.03.023

Zusammenfassung

Au cluster anions consisting of 2-13 atoms were soft-landed on native-oxide-covered Si wafers. Reaction of soft-landed clusters with an atomic oxygen atmosphere was studied using X-ray photoelectron spectroscopy (XPS). Au5, Au7 and Au13 turned out to show pronounced inertness for Au-oxide formation. When the samples with deposited Au clusters were treated with aqueous NaOH. the inert Aus. Au7, and Au13 clusters became reactive towards Au-oxide formation. whereas the other originally reactive clusters became inert. This result can be interpreted in terms of electronic modification of Au clusters by Na. which was also evidenced by Au 4f and Na 1s core level shifts.

Zusammenfassung in einer weiteren Sprache

Fachgebiet (DDC)
530 Physik

Schlagwörter

Au, Cluster, Oxidation, X-ray photoelectron spectroscopy

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ISO 690LIM, Dong Chan, Rainer DIETSCHE, Gerd GANTEFÖR, Young Dok KIM, 2009. Oxidation of deposited Aun (n = 2-13) on Si02 /Si : influence of the NaOH(aq) treatment. In: Chemical physics. 2009, 359(1-3), pp. 161-165. Available under: doi: 10.1016/j.chemphys.2009.03.023
BibTex
@article{Lim2009Oxida-4671,
  year={2009},
  doi={10.1016/j.chemphys.2009.03.023},
  title={Oxidation of deposited Aun (n = 2-13) on Si02 /Si : influence of the NaOH(aq) treatment},
  number={1-3},
  volume={359},
  journal={Chemical physics},
  pages={161--165},
  author={Lim, Dong Chan and Dietsche, Rainer and Ganteför, Gerd and Kim, Young Dok}
}
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