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Atomic force microscope based Kelvin probe measurements : application to an electrochemical reaction

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210_jphyschemB_1997.pdf
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1997

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Böhmisch, Mathias
Burmeister, Frank
Rettenberger, Armin
Zimmermann, Jörg

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Journal of Physical Chemistry / B. 1997, 101(49), pp. 10162-10165. Available under: doi: 10.1021/jp9728767

Zusammenfassung

An atomic force microscope (AFM) was utilized as a Kelvin probe to determine work functions of several metals and semiconductors quantitarively. Most of the experimental data show excellent agreement with published values measured by photoemission. Variations in work functions as low as 5 mV could be detected with a typical lateral resolution of 20 nm. This method allowed us to analyze and explain the energetics of an electrochemical reaction on the surface of WSe2, which could be in situ induced and controlled by an externally applied voltage between AFM tip and sample. Thus it could be exploited for etching nanostructures.

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530 Physik

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ISO 690BÖHMISCH, Mathias, Frank BURMEISTER, Armin RETTENBERGER, Jörg ZIMMERMANN, Johannes BONEBERG, Paul LEIDERER, 1997. Atomic force microscope based Kelvin probe measurements : application to an electrochemical reaction. In: Journal of Physical Chemistry / B. 1997, 101(49), pp. 10162-10165. Available under: doi: 10.1021/jp9728767
BibTex
@article{Bohmisch1997Atomi-9148,
  year={1997},
  doi={10.1021/jp9728767},
  title={Atomic force microscope based Kelvin probe measurements : application to an electrochemical reaction},
  number={49},
  volume={101},
  journal={Journal of Physical Chemistry / B},
  pages={10162--10165},
  author={Böhmisch, Mathias and Burmeister, Frank and Rettenberger, Armin and Zimmermann, Jörg and Boneberg, Johannes and Leiderer, Paul}
}
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