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Superhard, conductive coatings for atomic force microscopy cantilevers

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307_applph_2001.pdf
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2001

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Ronning, Carsten
Wondratschek, Oliver
Büttner, Michael
Hofsäss, Hans Christian
Zimmermann, Jörg

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Applied Physics Letters. 2001, 79(19), pp. 3053-3055. Available under: doi: 10.1063/1.1415354

Zusammenfassung

Boron carbide thin films were grown by mass selected ion beam deposition using low energy 11B+ and 12C+ ions at room temperature. The amorphous films exhibit any desired stoichiometry controlled by the ion charge ratio B+/C+. Films with a stoichiometry of B4C showed the optimal combination of a high mechanical strength and a low electrical resistivity for the coating of atomic force microscopy (AFM) silicon cantilevers. The properties of such AFM tips were evaluated and simultaneous topography and Kelvin mode AFM measurements with high lateral resolution were performed on the systems (i) Au nanoparticles on a p-WS2 surface and (ii) conducting/ superconducting YBa2Cu3O72x.

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530 Physik

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ISO 690RONNING, Carsten, Oliver WONDRATSCHEK, Michael BÜTTNER, Hans Christian HOFSÄSS, Jörg ZIMMERMANN, Paul LEIDERER, Johannes BONEBERG, 2001. Superhard, conductive coatings for atomic force microscopy cantilevers. In: Applied Physics Letters. 2001, 79(19), pp. 3053-3055. Available under: doi: 10.1063/1.1415354
BibTex
@article{Ronning2001Super-4754,
  year={2001},
  doi={10.1063/1.1415354},
  title={Superhard, conductive coatings for atomic force microscopy cantilevers},
  number={19},
  volume={79},
  journal={Applied Physics Letters},
  pages={3053--3055},
  author={Ronning, Carsten and Wondratschek, Oliver and Büttner, Michael and Hofsäss, Hans Christian and Zimmermann, Jörg and Leiderer, Paul and Boneberg, Johannes}
}
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