Publikation: Laser cleaning of polymer surfaces
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2001
Autor:innen
Fourrier, T.
Schrems, Gernot
Mühlberger, T.
Heitz, Johannes
Arnold, Nikita
Bäuerle, Dieter
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Applied Physics / A, Materials Science and Processing. 2001, 72(1), pp. 1-6. Available under: doi: 10.1007/s003390000683
Zusammenfassung
We have investigated the removal of small spherical particles from polymer surfaces by means of 193-nm ArF and 248-nm KrF laser light. Polystyrene (PS) particles with diameters in the range of 110 nm to 1700 nm and silica particles (SiO2) with sizes of 400 nm and 800 nm are successfully removed from two different substrates, polyimide (PI) and polymethylmethacrylate (PMMA). Experiments were performed in air (23°C, relative humidity 24% 28%) and in an environment with a relative humidity (RH) of about 90%.
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FOURRIER, T., Gernot SCHREMS, T. MÜHLBERGER, Johannes HEITZ, Nikita ARNOLD, Dieter BÄUERLE, Mario MOSBACHER, Johannes BONEBERG, Paul LEIDERER, 2001. Laser cleaning of polymer surfaces. In: Applied Physics / A, Materials Science and Processing. 2001, 72(1), pp. 1-6. Available under: doi: 10.1007/s003390000683BibTex
@article{Fourrier2001Laser-5253,
year={2001},
doi={10.1007/s003390000683},
title={Laser cleaning of polymer surfaces},
number={1},
volume={72},
journal={Applied Physics / A, Materials Science and Processing},
pages={1--6},
author={Fourrier, T. and Schrems, Gernot and Mühlberger, T. and Heitz, Johannes and Arnold, Nikita and Bäuerle, Dieter and Mosbacher, Mario and Boneberg, Johannes and Leiderer, Paul}
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<dcterms:abstract xml:lang="eng">We have investigated the removal of small spherical particles from polymer surfaces by means of 193-nm ArF and 248-nm KrF laser light. Polystyrene (PS) particles with diameters in the range of 110 nm to 1700 nm and silica particles (SiO2) with sizes of 400 nm and 800 nm are successfully removed from two different substrates, polyimide (PI) and polymethylmethacrylate (PMMA). Experiments were performed in air (23°C, relative humidity 24% 28%) and in an environment with a relative humidity (RH) of about 90%.</dcterms:abstract>
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