Influence of Si Surface Orientation on Screen-printed Ag/Al Contacts

Loading...
Thumbnail Image
Date
2015
Editors
Contact
Journal ISSN
Electronic ISSN
ISBN
Bibliographical data
Publisher
Series
URI (citable link)
ArXiv-ID
International patent number
Link to the license
EU project number
Project
Open Access publication
Collections
Restricted until
Title in another language
Research Projects
Organizational Units
Journal Issue
Publication type
Journal article
Publication status
Published in
Energy Procedia ; 77 (2015). - pp. 581-585. - eISSN 1876-6102
Abstract
In this study the influence of the crystallographic surface orientation of n-type Si wafers on the contact formation of Ag/Al thick film pastes to p+-type Si layers is investigated. Therefore, n-type Si wafers with two different crystallographic orientations, namely polished (111) and (100) FZ wafers, with BBr3 based emitter and 75 nm SiNx:H are screen-printed with Ag/Al paste. Then contacts are fired in either a slow firing process or a fast one with the same peak temperature. Afterwards, contacts are prepared for scanning electron microscopy (SEM) analysis. The Ag/Al contact spots show different shapes on the differently oriented surfaces. For the slow firing process, no significant difference in number and size of the contacts spots can be found for the two surfaces. For samples fired in the fast firing process, the density and size of the contact spots on (100)-oriented surfaces is strongly reduced, whereas for the (111) surfaces only a slight reduction in density is visible as compared to the slow firing process.
Summary in another language
Subject (DDC)
530 Physics
Keywords
Conference
Review
undefined / . - undefined, undefined. - (undefined; undefined)
Cite This
ISO 690FRITZ, Susanne, Stefanie EBERT, Axel HERGUTH, Giso HAHN, 2015. Influence of Si Surface Orientation on Screen-printed Ag/Al Contacts. In: Energy Procedia. 77, pp. 581-585. eISSN 1876-6102. Available under: doi: 10.1016/j.egypro.2015.07.083
BibTex
@article{Fritz2015Influ-32031,
  year={2015},
  doi={10.1016/j.egypro.2015.07.083},
  title={Influence of Si Surface Orientation on Screen-printed Ag/Al Contacts},
  volume={77},
  journal={Energy Procedia},
  pages={581--585},
  author={Fritz, Susanne and Ebert, Stefanie and Herguth, Axel and Hahn, Giso}
}
RDF
<rdf:RDF
    xmlns:dcterms="http://purl.org/dc/terms/"
    xmlns:dc="http://purl.org/dc/elements/1.1/"
    xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
    xmlns:bibo="http://purl.org/ontology/bibo/"
    xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
    xmlns:foaf="http://xmlns.com/foaf/0.1/"
    xmlns:void="http://rdfs.org/ns/void#"
    xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > 
  <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/32031">
    <dcterms:abstract xml:lang="eng">In this study the influence of the crystallographic surface orientation of n-type Si wafers on the contact formation of Ag/Al thick film pastes to p+-type Si layers is investigated. Therefore, n-type Si wafers with two different crystallographic orientations, namely polished (111) and (100) FZ wafers, with BBr3 based emitter and 75 nm SiNx:H are screen-printed with Ag/Al paste. Then contacts are fired in either a slow firing process or a fast one with the same peak temperature. Afterwards, contacts are prepared for scanning electron microscopy (SEM) analysis. The Ag/Al contact spots show different shapes on the differently oriented surfaces. For the slow firing process, no significant difference in number and size of the contacts spots can be found for the two surfaces. For samples fired in the fast firing process, the density and size of the contact spots on (100)-oriented surfaces is strongly reduced, whereas for the (111) surfaces only a slight reduction in density is visible as compared to the slow firing process.</dcterms:abstract>
    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2015-10-30T13:41:31Z</dc:date>
    <dcterms:issued>2015</dcterms:issued>
    <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/32031/1/Fritz_0-304240.pdf"/>
    <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2015-10-30T13:41:31Z</dcterms:available>
    <dc:contributor>Ebert, Stefanie</dc:contributor>
    <dcterms:rights rdf:resource="http://creativecommons.org/licenses/by-nc-nd/4.0/"/>
    <dc:creator>Herguth, Axel</dc:creator>
    <dc:contributor>Hahn, Giso</dc:contributor>
    <dc:creator>Hahn, Giso</dc:creator>
    <dc:language>eng</dc:language>
    <dc:contributor>Herguth, Axel</dc:contributor>
    <dcterms:title>Influence of Si Surface Orientation on Screen-printed Ag/Al Contacts</dcterms:title>
    <dc:creator>Ebert, Stefanie</dc:creator>
    <foaf:homepage rdf:resource="http://localhost:8080/"/>
    <dc:contributor>Fritz, Susanne</dc:contributor>
    <dc:creator>Fritz, Susanne</dc:creator>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/32031"/>
    <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/32031/1/Fritz_0-304240.pdf"/>
    <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dc:rights>Attribution-NonCommercial-NoDerivatives 4.0 International</dc:rights>
  </rdf:Description>
</rdf:RDF>
Internal note
xmlui.Submission.submit.DescribeStep.inputForms.label.kops_note_fromSubmitter
Contact
URL of original publication
Test date of URL
Examination date of dissertation
Method of financing
Comment on publication
Alliance license
Corresponding Authors der Uni Konstanz vorhanden
International Co-Authors
Bibliography of Konstanz
Yes
Refereed