Laser cleaning of polymer surfaces

Type of Publication: Journal article
URI (citable link): http://nbn-resolving.de/urn:nbn:de:bsz:352-opus-28457
Author: Fourrier, T.; Schrems, Gernot; Mühlberger, T.; Heitz, Johannes; Arnold, Nikita; Bäuerle, Dieter; Mosbacher, Mario; Boneberg, Johannes; Leiderer, Paul
Year of publication: 2001
Published in: Applied Physics / A, Materials Science and Processing ; 72 (2001), 1. - pp. 1-6
DOI (citable link): https://dx.doi.org/10.1007/s003390000683
Summary:
We have investigated the removal of small spherical particles from polymer surfaces by means of 193-nm ArF and 248-nm KrF laser light. Polystyrene (PS) particles with diameters in the range of 110 nm to 1700 nm and silica particles (SiO2) with sizes of 400 nm and 800 nm are successfully removed from two different substrates, polyimide (PI) and polymethylmethacrylate (PMMA). Experiments were performed in air (23°C, relative humidity 24% 28%) and in an environment with a relative humidity (RH) of about 90%.
PACS Classification: 42.62.Cf
Subject (DDC): 530 Physics
Link to License: Attribution-NonCommercial-NoDerivs 2.0 Generic
Bibliography of Konstanz: Yes

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FOURRIER, T., Gernot SCHREMS, T. MÜHLBERGER, Johannes HEITZ, Nikita ARNOLD, Dieter BÄUERLE, Mario MOSBACHER, Johannes BONEBERG, Paul LEIDERER, 2001. Laser cleaning of polymer surfaces. In: Applied Physics / A, Materials Science and Processing. 72(1), pp. 1-6. Available under: doi: 10.1007/s003390000683

@article{Fourrier2001Laser-5253, title={Laser cleaning of polymer surfaces}, year={2001}, doi={10.1007/s003390000683}, number={1}, volume={72}, journal={Applied Physics / A, Materials Science and Processing}, pages={1--6}, author={Fourrier, T. and Schrems, Gernot and Mühlberger, T. and Heitz, Johannes and Arnold, Nikita and Bäuerle, Dieter and Mosbacher, Mario and Boneberg, Johannes and Leiderer, Paul} }

<rdf:RDF xmlns:dcterms="http://purl.org/dc/terms/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#" xmlns:foaf="http://xmlns.com/foaf/0.1/" xmlns:void="http://rdfs.org/ns/void#" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/rdf/resource/123456789/5253"> <dc:contributor>Boneberg, Johannes</dc:contributor> <dc:creator>Schrems, Gernot</dc:creator> <dcterms:rights rdf:resource="http://creativecommons.org/licenses/by-nc-nd/2.0/"/> <dc:language>eng</dc:language> <dc:contributor>Heitz, Johannes</dc:contributor> <dc:creator>Leiderer, Paul</dc:creator> <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/> <dc:creator>Heitz, Johannes</dc:creator> <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5253/1/276_applph_2001.pdf"/> <dcterms:title>Laser cleaning of polymer surfaces</dcterms:title> <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/rdf/resource/123456789/41"/> <dc:contributor>Leiderer, Paul</dc:contributor> <dc:contributor>Mühlberger, T.</dc:contributor> <dcterms:issued>2001</dcterms:issued> <dc:creator>Mosbacher, Mario</dc:creator> <dc:creator>Bäuerle, Dieter</dc:creator> <dc:creator>Boneberg, Johannes</dc:creator> <dc:creator>Arnold, Nikita</dc:creator> <dc:creator>Fourrier, T.</dc:creator> <dcterms:bibliographicCitation>First publ. in: Applied Physics / A, Materials Science and Processing, 72 (2001), 1, pp.1-6</dcterms:bibliographicCitation> <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/rdf/resource/123456789/41"/> <dc:contributor>Bäuerle, Dieter</dc:contributor> <dc:contributor>Fourrier, T.</dc:contributor> <dcterms:abstract xml:lang="eng">We have investigated the removal of small spherical particles from polymer surfaces by means of 193-nm ArF and 248-nm KrF laser light. Polystyrene (PS) particles with diameters in the range of 110 nm to 1700 nm and silica particles (SiO2) with sizes of 400 nm and 800 nm are successfully removed from two different substrates, polyimide (PI) and polymethylmethacrylate (PMMA). Experiments were performed in air (23°C, relative humidity 24% 28%) and in an environment with a relative humidity (RH) of about 90%.</dcterms:abstract> <foaf:homepage rdf:resource="http://localhost:8080/jspui"/> <dc:contributor>Schrems, Gernot</dc:contributor> <dc:contributor>Mosbacher, Mario</dc:contributor> <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5253/1/276_applph_2001.pdf"/> <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/5253"/> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:54:22Z</dcterms:available> <dc:format>application/pdf</dc:format> <dc:rights>Attribution-NonCommercial-NoDerivs 2.0 Generic</dc:rights> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:54:22Z</dc:date> <dc:creator>Mühlberger, T.</dc:creator> <dc:contributor>Arnold, Nikita</dc:contributor> </rdf:Description> </rdf:RDF>

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