Colloid monolayer lithography : a flexible approach for nanostructuring of surfaces
| Type of Publication: | Journal article |
| URI (citable link): | http://nbn-resolving.de/urn:nbn:de:bsz:352-opus-28829 |
| Author: | Burmeister, Frank; Badowsky, Wilfried; Braun, T.; Wieprich, Silvana; Boneberg, Johannes; Leiderer, Paul |
| Year of publication: | 1999 |
| Published in: | Applied Surface Science ; 144-145 (1999). - pp. 461-466 |
| DOI (citable link): | https://dx.doi.org/10.1016/S0169-4332(98)00840-X |
| Summary: |
In this paper, we report on an alternative nanofabrication method which relies on self-assembly of colloidal particles into a two-dimensional array on surfaces. Some important parameters for obtaining large monolayers of good crystallinity are discussed, i.e., the evaporation rate of the colloid suspension, the surface charge of the particles and the wetting properties of the substrate. The 2D crystals can be utilized as lithographic masks for consecutive processes. This 1s demonstrated with two experiments, site-selective electrochemical deposition of copper on a semiconductor surface and shape modification of small metallic dots by thermal annealing.
|
| Subject (DDC): | 530 Physics |
| Keywords: | Nanostructuring, self-assembly, Colloids, Metal dots |
| Link to License: | Terms of use |
| Bibliography of Konstanz: | Yes |
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BURMEISTER, Frank, Wilfried BADOWSKY, T. BRAUN, Silvana WIEPRICH, Johannes BONEBERG, Paul LEIDERER, 1999. Colloid monolayer lithography : a flexible approach for nanostructuring of surfaces. In: Applied Surface Science. 144-145, pp. 461-466. Available under: doi: 10.1016/S0169-4332(98)00840-X
@article{Burmeister1999Collo-5211, title={Colloid monolayer lithography : a flexible approach for nanostructuring of surfaces}, year={1999}, doi={10.1016/S0169-4332(98)00840-X}, volume={144-145}, journal={Applied Surface Science}, pages={461--466}, author={Burmeister, Frank and Badowsky, Wilfried and Braun, T. and Wieprich, Silvana and Boneberg, Johannes and Leiderer, Paul} }
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