3He impurity effects on the growth kinetics of 4He crystals
| Type of Publication: | Journal article |
| URI (citable link): | http://nbn-resolving.de/urn:nbn:de:bsz:352-opus-29055 |
| Author: | Suzuki, M.; Thiel, M.; Leiderer, Paul |
| Year of publication: | 1997 |
| Published in: | Journal of Low Temperature Physics ; 109 (1997), 1-2. - pp. 357-367 |
| DOI (citable link): | https://dx.doi.org/10.1007/s10909-005-0090-4 |
| Summary: |
We report the growth kinetics of the 4He crystals with a small amount of 3He impurities around 0.8 K. The growth resistance was measured using the response of the charged interface with respect to an externally applied voltage. In 5ppm and lOppm 3He mixtures, it is found that ( 1 ) the relaxation process can be expressed as an exponential behavior, (2) the growth resistance becomes larger compared to pure 4He and does not have a strong 3He concentration dependence, and (3) the temperature dependence of the growth resistance is much the same as pure 4He. We discuss several possible explanations of the present experiment.
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| Subject (DDC): | 530 Physics |
| Link to License: | In Copyright |
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SUZUKI, M., M. THIEL, Paul LEIDERER, 1997. 3He impurity effects on the growth kinetics of 4He crystals. In: Journal of Low Temperature Physics. 109(1-2), pp. 357-367. Available under: doi: 10.1007/s10909-005-0090-4
@article{Suzuki1997impur-5202, title={3He impurity effects on the growth kinetics of 4He crystals}, year={1997}, doi={10.1007/s10909-005-0090-4}, number={1-2}, volume={109}, journal={Journal of Low Temperature Physics}, pages={357--367}, author={Suzuki, M. and Thiel, M. and Leiderer, Paul} }
<rdf:RDF xmlns:dcterms="http://purl.org/dc/terms/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#" xmlns:foaf="http://xmlns.com/foaf/0.1/" xmlns:void="http://rdfs.org/ns/void#" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/rdf/resource/123456789/5202"> <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/> <dcterms:bibliographicCitation>First publ. in: Journal of Low Temperature Physics 109 (1997), 1-2, pp. 357-367</dcterms:bibliographicCitation> <dc:language>eng</dc:language> <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5202/1/220_jlowtempph_1997.pdf"/> <dcterms:abstract xml:lang="eng">We report the growth kinetics of the 4He crystals with a small amount of 3He impurities around 0.8 K. The growth resistance was measured using the response of the charged interface with respect to an externally applied voltage. In 5ppm and lOppm 3He mixtures, it is found that ( 1 ) the relaxation process can be expressed as an exponential behavior, (2) the growth resistance becomes larger compared to pure 4He and does not have a strong 3He concentration dependence, and (3) the temperature dependence of the growth resistance is much the same as pure 4He. We discuss several possible explanations of the present experiment.</dcterms:abstract> <dc:creator>Leiderer, Paul</dc:creator> <dc:creator>Thiel, M.</dc:creator> <dc:contributor>Leiderer, Paul</dc:contributor> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:53:58Z</dcterms:available> <dc:creator>Suzuki, M.</dc:creator> <dc:contributor>Suzuki, M.</dc:contributor> <dc:format>application/pdf</dc:format> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:53:58Z</dc:date> <foaf:homepage rdf:resource="http://localhost:8080/jspui"/> <dcterms:rights rdf:resource="https://creativecommons.org/licenses/by-nc-nd/2.0/legalcode"/> <dcterms:issued>1997</dcterms:issued> <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/5202"/> <dcterms:title>3He impurity effects on the growth kinetics of 4He crystals</dcterms:title> <dc:rights>terms-of-use</dc:rights> <dc:contributor>Thiel, M.</dc:contributor> <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5202/1/220_jlowtempph_1997.pdf"/> <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/rdf/resource/123456789/41"/> <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/rdf/resource/123456789/41"/> </rdf:Description> </rdf:RDF>
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