Occurrence of Sharp Hydrogen Effusion Peaks of Hydrogenated Amorphous Silicon Film and Its Connection to Void Structures
| Type of Publication: | Journal article |
| Publication status: | Published |
| URI (citable link): | http://nbn-resolving.de/urn:nbn:de:bsz:352-2-iv6styvkg2jn6 |
| Author: | Jafari, Sahar; Steffens, Jonathan; Wendt, Michael; Terheiden, Barbara; Meyer, Sylke; Lausch, Dominik |
| Year of publication: | 2020 |
| Published in: | Physica Status Solidi (B) - Basic Solid State Physics ; 257 (2020), 9. - 2000097. - Wiley. - ISSN 0370-1972. - eISSN 1521-3951 |
| DOI (citable link): | https://dx.doi.org/10.1002/pssb.202000097 |
| Subject (DDC): | 530 Physics |
| Link to License: | In Copyright |
| Bibliography of Konstanz: | Yes |
| Refereed: | Yes |
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JAFARI, Sahar, Jonathan STEFFENS, Michael WENDT, Barbara TERHEIDEN, Sylke MEYER, Dominik LAUSCH, 2020. Occurrence of Sharp Hydrogen Effusion Peaks of Hydrogenated Amorphous Silicon Film and Its Connection to Void Structures. In: Physica Status Solidi (B) - Basic Solid State Physics. Wiley. 257(9), 2000097. ISSN 0370-1972. eISSN 1521-3951. Available under: doi: 10.1002/pssb.202000097
@article{Jafari2020-09Occur-49824, title={Occurrence of Sharp Hydrogen Effusion Peaks of Hydrogenated Amorphous Silicon Film and Its Connection to Void Structures}, year={2020}, doi={10.1002/pssb.202000097}, number={9}, volume={257}, issn={0370-1972}, journal={Physica Status Solidi (B) - Basic Solid State Physics}, author={Jafari, Sahar and Steffens, Jonathan and Wendt, Michael and Terheiden, Barbara and Meyer, Sylke and Lausch, Dominik}, note={Article Number: 2000097} }
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