Occurrence of Sharp Hydrogen Effusion Peaks of Hydrogenated Amorphous Silicon Film and Its Connection to Void Structures
| Type of Publication: | Journal article |
| Publication status: | Published |
| Author: | Jafari, Sahar; Steffens, Jonathan; Wendt, Michael; Terheiden, Barbara; Meyer, Sylke; Lausch, Dominik |
| Year of publication: | 2020 |
| Published in: | Physica Status Solidi (B) - Basic Solid State Physics ; 2020. - Wiley. - ISSN 0370-1972. - eISSN 1521-3951 |
| DOI (citable link): | https://dx.doi.org/10.1002/pssb.202000097 |
| Subject (DDC): | 530 Physics |
| Refereed: | Yes |
| Online First: Journal articles that are published online before they appear as an actual part of a journal issue. Online first articles are published on the journal's website in the publisher's version. | |
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JAFARI, Sahar, Jonathan STEFFENS, Michael WENDT, Barbara TERHEIDEN, Sylke MEYER, Dominik LAUSCH, 2020. Occurrence of Sharp Hydrogen Effusion Peaks of Hydrogenated Amorphous Silicon Film and Its Connection to Void Structures. In: Physica Status Solidi (B) - Basic Solid State Physics. Wiley. ISSN 0370-1972. eISSN 1521-3951. Available under: doi: 10.1002/pssb.202000097
@article{Jafari2020-05-28Occur-49824, title={Occurrence of Sharp Hydrogen Effusion Peaks of Hydrogenated Amorphous Silicon Film and Its Connection to Void Structures}, year={2020}, doi={10.1002/pssb.202000097}, issn={0370-1972}, journal={Physica Status Solidi (B) - Basic Solid State Physics}, author={Jafari, Sahar and Steffens, Jonathan and Wendt, Michael and Terheiden, Barbara and Meyer, Sylke and Lausch, Dominik} }
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Except where otherwise noted, this item's license is described as Attribution 4.0 International
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