Type of Publication: | Journal article |
Publication status: | Published |
URI (citable link): | http://nbn-resolving.de/urn:nbn:de:bsz:352-2-iv6styvkg2jn6 |
Author: | Jafari, Sahar; Steffens, Jonathan; Wendt, Michael; Terheiden, Barbara; Meyer, Sylke; Lausch, Dominik |
Year of publication: | 2020 |
Published in: | Physica Status Solidi (B) - Basic Solid State Physics ; 257 (2020), 9. - 2000097. - Wiley. - ISSN 0370-1972. - eISSN 1521-3951 |
DOI (citable link): | https://dx.doi.org/10.1002/pssb.202000097 |
Subject (DDC): | 530 Physics |
Link to License: | In Copyright |
Bibliography of Konstanz: | Yes |
Refereed: | Yes |
JAFARI, Sahar, Jonathan STEFFENS, Michael WENDT, Barbara TERHEIDEN, Sylke MEYER, Dominik LAUSCH, 2020. Occurrence of Sharp Hydrogen Effusion Peaks of Hydrogenated Amorphous Silicon Film and Its Connection to Void Structures. In: Physica Status Solidi (B) - Basic Solid State Physics. Wiley. 257(9), 2000097. ISSN 0370-1972. eISSN 1521-3951. Available under: doi: 10.1002/pssb.202000097
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