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Occurrence of Sharp Hydrogen Effusion Peaks of Hydrogenated Amorphous Silicon Film and Its Connection to Void Structures

Occurrence of Sharp Hydrogen Effusion Peaks of Hydrogenated Amorphous Silicon Film and Its Connection to Void Structures

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JAFARI, Sahar, Jonathan STEFFENS, Michael WENDT, Barbara TERHEIDEN, Sylke MEYER, Dominik LAUSCH, 2020. Occurrence of Sharp Hydrogen Effusion Peaks of Hydrogenated Amorphous Silicon Film and Its Connection to Void Structures. In: Physica Status Solidi (B) - Basic Solid State Physics. Wiley. 257(9), 2000097. ISSN 0370-1972. eISSN 1521-3951. Available under: doi: 10.1002/pssb.202000097

@article{Jafari2020-09Occur-49824, title={Occurrence of Sharp Hydrogen Effusion Peaks of Hydrogenated Amorphous Silicon Film and Its Connection to Void Structures}, year={2020}, doi={10.1002/pssb.202000097}, number={9}, volume={257}, issn={0370-1972}, journal={Physica Status Solidi (B) - Basic Solid State Physics}, author={Jafari, Sahar and Steffens, Jonathan and Wendt, Michael and Terheiden, Barbara and Meyer, Sylke and Lausch, Dominik}, note={Article Number: 2000097} }

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