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Influencing Light and Elevated Temperature Induced Degradation and Surface-Related Degradation Kinetics in Float-Zone Silicon by Varying the Initial Sample State

Influencing Light and Elevated Temperature Induced Degradation and Surface-Related Degradation Kinetics in Float-Zone Silicon by Varying the Initial Sample State

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HAMMANN, Benjamin, Josh ENGELHARDT, David SPERBER, Axel HERGUTH, Giso HAHN, 2020. Influencing Light and Elevated Temperature Induced Degradation and Surface-Related Degradation Kinetics in Float-Zone Silicon by Varying the Initial Sample State. In: IEEE Journal of Photovoltaics. Institute of Electrical and Electronics Engineers (IEEE). 10(1), pp. 85-93. ISSN 2156-3381. eISSN 2156-3403. Available under: doi: 10.1109/JPHOTOV.2019.2954768

@article{Hammann2020-01Influ-48137, title={Influencing Light and Elevated Temperature Induced Degradation and Surface-Related Degradation Kinetics in Float-Zone Silicon by Varying the Initial Sample State}, year={2020}, doi={10.1109/JPHOTOV.2019.2954768}, number={1}, volume={10}, issn={2156-3381}, journal={IEEE Journal of Photovoltaics}, pages={85--93}, author={Hammann, Benjamin and Engelhardt, Josh and Sperber, David and Herguth, Axel and Hahn, Giso} }

2020-01-03T08:44:14Z Hammann, Benjamin Herguth, Axel Hahn, Giso Influencing Light and Elevated Temperature Induced Degradation and Surface-Related Degradation Kinetics in Float-Zone Silicon by Varying the Initial Sample State Hammann, Benjamin 2020-01-03T08:44:14Z Sperber, David Light and elevated temperature induced degradation (LeTID) kinetics in float-zone silicon are investigated by varying the initial sample state, composed of different base material, base doping, SiN <sub>x</sub> :H films, and subsequent firing, and/or annealing steps. The approach of deliberately changing the initial sample state is shown to allow for specific studies of influences of LeTID kinetics. Bulk- and surface-related degradations are examined separately and the influence on the kinetics of bulk- and surface-related degradation is illustrated by a four-state and three-state model, respectively. In case of bulk-related degradation, an increase in defect density because of the firing step is shown, whereas the annealing step has an inverse effect. Both temperature steps—individually and combined—influence the transition rates of bulk-related degradation and regeneration by presumably changing the distribution of a defect precursor. For surface-related degradation, the firing step reduces the transition rate from the initial to the degraded state. In addition, the influence of a comparably humid atmosphere and the absence of UV light are found to be negligible. eng Engelhardt, Josh 2020-01 Engelhardt, Josh Sperber, David terms-of-use Herguth, Axel Hahn, Giso

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