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Advanced scanning probe lithography using anatase-to-rutile transition to create localized TiO<sub>2</sub> nanorods

Advanced scanning probe lithography using anatase-to-rutile transition to create localized TiO2 nanorods

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KALB, Julian, Vanessa KNITTEL, Lukas SCHMIDT-MENDE, 2019. Advanced scanning probe lithography using anatase-to-rutile transition to create localized TiO2 nanorods. In: Beilstein Journal of Nanotechnology. 10, pp. 412-418. eISSN 2190-4286. Available under: doi: 10.3762/bjnano.10.40

@article{Kalb2019-02-08Advan-45151, title={Advanced scanning probe lithography using anatase-to-rutile transition to create localized TiO2 nanorods}, year={2019}, doi={10.3762/bjnano.10.40}, volume={10}, journal={Beilstein Journal of Nanotechnology}, pages={412--418}, author={Kalb, Julian and Knittel, Vanessa and Schmidt-Mende, Lukas} }

2019-02-21T13:20:42Z Kalb, Julian Kalb, Julian eng Schmidt-Mende, Lukas Advanced scanning probe lithography using anatase-to-rutile transition to create localized TiO<sub>2</sub> nanorods In this article, we demonstrate the position-controlled hydrothermal growth of rutile TiO<sub>2</sub> nanorods using a new scanning probe lithography method in which a silicon tip, commonly used for atomic force microscopy, was pulled across an anatase TiO<sub>2</sub> film. This process scratches the film causing tiny anatase TiO<sub>2</sub> nanoparticles to form on the surface. According to previous reports, these anatase particles convert into rutile nanocrystals and provide the growth of rutile TiO<sub>2</sub> nanorods in well-defined areas. Due to the small tip radius, the resolution of this method is excellent and the method is quite inexpensive compared to electron-beam lithography and similar methods providing a position-controlled growth of semiconducting TiO<sub>2</sub> nanostructures. 2019-02-21T13:20:42Z Knittel, Vanessa terms-of-use 2019-02-08 Schmidt-Mende, Lukas Knittel, Vanessa

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