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Multi-characterization study of interface passivation quality of amorphous sub-stoichiometric silicon oxide and silicon oxynitride layers for photovoltaic applications

Multi-characterization study of interface passivation quality of amorphous sub-stoichiometric silicon oxide and silicon oxynitride layers for photovoltaic applications

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STEFFENS, Jonathan, Maria Antonietta FAZIO, Daniela CAVALCOLI, Barbara TERHEIDEN, 2018. Multi-characterization study of interface passivation quality of amorphous sub-stoichiometric silicon oxide and silicon oxynitride layers for photovoltaic applications. In: Solar Energy Materials and Solar Cells. 187, pp. 104-112. ISSN 0927-0248. eISSN 1879-3398. Available under: doi: 10.1016/j.solmat.2018.07.024

@article{Steffens2018-12Multi-43427, title={Multi-characterization study of interface passivation quality of amorphous sub-stoichiometric silicon oxide and silicon oxynitride layers for photovoltaic applications}, year={2018}, doi={10.1016/j.solmat.2018.07.024}, volume={187}, issn={0927-0248}, journal={Solar Energy Materials and Solar Cells}, pages={104--112}, author={Steffens, Jonathan and Fazio, Maria Antonietta and Cavalcoli, Daniela and Terheiden, Barbara} }

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